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產品介紹
產品介紹
A. 8英寸列表/8inch list.
| Item | Area | Vendor | Tool Model by vendor | Tool Composition - Specific Information per Frame or Chamber | Description | S.N | Manufacturing Year |
| 1 | CMP | LAM | TERES | 2 belt: L,R, 4 head | 5169 | 2001/Apr | |
| 2 | CMP | LAM | TERES | 2 belt: L,R, 4 head | 5175 | 2001/Apr | |
| 3 | CMP | LAM | TERES | 2 belt: L,R, 4 head | 5162 | 2001/Apr | |
| 4 | CMP | LAM | TERES | 2 belt: L,R, 4 head | 5157 | 2001/Apr | |
| 5 | DIFF | TEL | Alpha-8SE-ZANRS | Furnace (Batch of 150wfr) | H2 Sinter, Furnace (Batch of 150wfr)(N2, H2) | M00000115019 | 2001/Mar |
| 6 | DIFF | TEL | Alpha-8SE-ZVANS | Furnace (Batch of 150wfr) | SIN-LPC-M01(N2, NH3, SiH2Cl2) | M000000Z5694 | 2001/Apr |
| 7 | DIFF | KOKUSAI | DJ-853V-8BL | Furnace (Batch of 75wfr) | 硅烷，做氧化，CLTSIN-LPC-M01 | T2DC3-12042-1 | 2004/Jul |
| 8 | DIFF | AMAT | XE Plus Centura | 2ch | RTO (Rapid thermal oxidation) | 318208 | 2001/Apr |
| 9 | DIFF | KOKUSAI | DJ-823V | Furnace (Batch of 150wfr) | a-Si, Furnace (Batch of 150wfr)(N2, SiH4, CIF3, AIR/N2) poly | T2DC3-11451-1 | 2001/Apr |
| 10 | DIFF | KOKUSAI | DJ-823V | Furnace (Batch of 150wfr) | a-Si, Furnace (Batch of 150wfr)(N2, SiH4, CIF3, AIR/N2) poly | T2DC3-11452-2 | 2001/Apr |
| 11 | DIFF | TEL | Alpha-8SE-ZVNS | Furnace (Batch of 150wfr) | LP-SIN, Furnace (Batch of 151wfr)，(N2, NH3, SiH2Cl2) | M000000Z5594 | 2001/Apr |
| 12 | DIFF | TEL | Trias-SPA | 1ch | Furnace (Batch of 100wfr) | H10118 | 2003/Jan |
| 13 | DIFF | TEL | Alpha-8SE-ZVANS | Furnace (Batch of 100wfr) | TEOS-LPC-M02(N2, O2, TEOS) | M000000Z5589 | 2001/Apr |
| 14 | DIFF | KOKUSAI | DJ-823V-8BL3 | Furnace (Batch of 100wfr) | BTBAS, 850°Furnace (Batch of 100wfr)(N2, NH3, I2, NF3, BTBAS) | T2DC3-11754-1 | 2002/Dec |
| 15 | DRY ETCH | TEL | UnityⅡe855DS | 2ch SCCM: | 2ch SCCM: 二氧化硅 | U02153 | 2003/Jan |
| 16 | DRY ETCH | LAM | Alliance 9400PTX | 2ch PTX: | 2ch PTX: | 80197 | 2001/Mar |
| 17 | DRY ETCH | SHIBAURA | Allegro-ICE200 | 2ch | 2ch Photo Resist Strip | VFX0115 | 2002/Jul |
| 18 | DRY ETCH | SHIBAURA | Allegro-ICE200 | 2ch | 2ch Photo Resist Strip | SFX0182 | 2002/Dec |
| 19 | DRY ETCH | HITACHI | U622 | 2ch | 2ch oxide etch 二氧化硅 | 2003/Mar | |
| 20 | DRY ETCH | TEL | UnityⅡe855DS | 2ch SCCM: | 2ch SCCM: | U01846 | 2001/Mar |
| 21 | DRY ETCH | SHIBAURA | Allegro-ICE200 | 2ch | 2ch Photo Resist Strip | SFX0184 | 2000/Dec |
| 22 | Fab5 - DRY ETCH | TOK | TCA-3822 | 2ch:Ashing CH-1/2 | Frame 去胶 | T-9509372 | 1999/May |
| 23 | IMP | SEN | NV-GSD-LE | Frame | I01 | 2004/Dec | |
| 24 | IMP | SEN | NV-GSD-LE | Frame | B67 | 2001/Apr | |
| 25 | IMP | Nissin | EXCEED 2000A | Frame | F01466 | 2001/Apr | |
| 26 | IMP | Nissin | EXCEED 2000A | Frame | F01467 | 2001/Apr | |
| 27 | PHOTO | Canon | FPA-3000 EX6 | Frame | 8" Notch Giga laser(G10K-30), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit, | 1035302 | 2001/Mar |
| 28 | PHOTO | TEL | CLEAN TRACK ACT8 | Frame | D-9201719 | 2001/Mar | |
| 29 | PHOTO | Canon | FPA-3000 EX6 | Frame | 8" Notch Giga laser(G10K-30), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit, | 1045309 | 2002/Dec |
| 30 | PHOTO | TEL | CLEAN TRACK ACT8 | Frame | D-9201721 | 2001/May | |
| 31 | PHOTO | SCREEN | SC-80BW-AV | Frame | 60700-3696 | 2001/Jan | |
| 32 | PHOTO | Canon | FPA-3000 EX6 | Frame | 8" Notch Cymer laser(ELS-5310), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit, | 1025300 | 2001/Feb |
| 33 | PHOTO | TEL | CLEAN TRACK ACT8 | Frame | D-9201718 | 2001/Mar | |
| 34 | PHOTO | Canon | FPA-3000 EX6 | Frame | 8" Notch Giga laser(G10K-30), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit, | 1035311 | 2001/Apr |
| 35 | PHOTO | TEL | CLEAN TRACK ACT8 | Frame | D-9201720 | 2001/Mar | |
| 36 | PHOTO | Canon | FPA-3000 i5+ | Frame | 1012705 | 2001/Feb | |
| 37 | PHOTO | SCREEN | SK-80BW-AVQ | Frame | 60700-3713 | 2001/Mar | |
| 38 | TF | AMAT | Centura Gigafill | 3ch | 3腔BPSG | 309817 | 2001/Mar |
| 39 | TF | LAM | CONCEPT TWO | 2M | SiN PECVD | 00-49-C26143 | 2001/Mar |
| 40 | TF | ASM | EAGLE-10 Trident-3RC | 3ch | PECVD (AntiReflectiveLayer) | WAJ-8512 | 2001/Mar |
| 41 | TF | ASM | EAGLE-10 Trident-3RC | 3ch | PECVD (AntiReflectiveLayer) | WAJ-8502 | 2001/Mar |
| 42 | TF | ASM | EAGLE-10 Trident-3RC | 3ch | PECVD (AntiReflectiveLayer) | 1065 | 2003/Jan |
| 43 | TF | AMAT | Endura | 2ch PC, 2ch Co, 1ch Ti: | 2ch PC, 2ch Co, 1ch Ti: | 317559PE | 2001/Apr |
| 44 | TF | LAM | Sabre XT | 3cell | 3cell 铜电镀 | CuxT0040 | 2001/Apr |
| 45 | TF | LAM | Concept-Two Inova | 2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch: | 2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch: | IC20491 | 2001/Apr |
| 46 | TF | LAM | Concept-Two Inova | 2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch: | 2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch: | IC20506 | 2003/Jan |
| 47 | TF | AMAT | Centura SA-NSG DxZ | 3ch | 3ch TEOS | 309905 | 2001/Mar |
| 48 | TF | AMAT | Centura Tectra | 1ch PC, 1ch Ti, 1ch TiN: | 1ch PC, 1ch Ti, 1ch TiN: | 319139MC | 2001/Mar |
| 49 | TF | TEL | MB2-720 | 3ch | 3ch W-si (DCS，WF6) | MCJ,160 | 2015/Jul |
| 50 | Fab5 - TF | AMAT | Centura 5200 | 3ch:WxZ CH-A/B/C | 3ch W CVD | 2641 | 1995/Oct |
| 51 | WET ETCH | TEL | PR200Z | 1ch | N021062 | 2002/Dec | |
| 52 | WET ETCH | SCREEN | SS-W80-AR | 2ch Surface wet2ch Back wetNo oven | 2ch Surface wet2ch Back wetNo oven | 60700-3726 | 2001/Apr |
| 53 | WET ETCH | Dantakuma | SR20 | 1ch HF1ch APM1ch QDR1ch F/RS/D | 1ch HF1ch APM1ch QDR1ch F/RS/D | 08-SR20 | 2008/May |
| 54 | WET ETCH | SCREEN | FC-821L | 2ch | 批式多晶硅清洗 | 60630-2640 | 2001/Apr |
| 55 | WET ETCH | SCREEN | FC-821L | 2ch | 60630-2653 | 2001/Apr | |
| 56 | WET ETCH | SCREEN | FC-821L | 2ch | 60630-2662 | 2001/Apr | |
| 57 | WET ETCH | SCREEN | FC-821L | 2ch | 60630-2639 | 2001/Apr | |
| 58 | WET ETCH | SEZ | SEZ203 | Frame | 单片多晶硅清洗HF,HNO3 | 485 | 2001/Apr |
| 59 | Metrology | KLA | KLA-5300 | Frame | OVERLAY | 3101 | 2001/Jan |
| 60 | Metrology | HITACHI | S-9220 | Frame | CDSEM | 2863989 | 2001/Jan |
| 61 | Metrology | KLA | Therma-Wave TP500 | Frame | 热波仪,离子注入和其他工艺无损非接触测量 | 3832 | 2000/Dec |
| 62 | Metrology | Veeco | D9000 | Frame | AFM原子力显微镜 | 126 | 2001/Feb |
| 63 | Metrology | KLA | FLX5400 | Frame | 应力测量 | 0101-4810 | 2001/Jan |
| 64 | Metrology | SANYO TRADING | IR EPOCH 2500 | Frame | 29808 | 2001/Jan | |
| 65 | Metrology | Olympus | AL2100 | Frame | 12021 | 2001/Jan | |
| 66 | Metrology | Olympus | AL2100 | Frame | 12018 | 2000/Dec | |
| 67 | Metrology | AMAT | SEM Vision cX | Frame | 缺陷扫描 | W828 | 2001/Jan |
| 68 | Metrology | HITACHI | S-9220 | Frame | CDSEM | 2863138 | 2000/Dec |
| 69 | Metrology | KLA | Optiprobe 3290/3290 DUV | Frame | FILM膜厚测量 | 6941 | 2000/Dec |
| 70 | Metrology | KLA | Optiprobe 5240AE | Frame | FILM膜厚测量 | 8183 | 2000/Dec |
B.設備工具明細/Tool List：
01.
| No | Maker | P/N | Description | Condition |
| 1 | - | Endura Mainframe & Monolith | 2nd New | |
| 2 | - | 15V D.C Power Supply | 2nd New | |
| 3 | - | 24V D.C Power Supply | 2nd New | |
| 4 | 332102 | GRANVILLE-PHILLIPS Ionization Gauge Supply | OEM | |
| 5 | 0010-20005 | 5 PHASE DRIVER BOX | 2nd New | |
| 6 | 0010-20004 | SYS ELEC EXOANDED CARD CAGE(7 SLOT) | 2nd New | |
| 7 | 0010-20003 | SYS CONTROLLER CARD CAGE | 2nd New | |
| 8 | 0680-01470 | CB PNL BD INTERIOR 30 POS 225A | 2nd New | |
| 9 | 0680-01204 | CB PNL BD INTERIOR 42 POS 225A | 2nd New | |
| 10 | 0680-01205 | CB PNL BD INTERIOR 54 POS 225A | 2nd New | |
| 11 | AMAT | 0190-35875 | DxZ Heater Driver, Single Phase | New |
| 12 | AMAT | 0190-09419 | WxZ Heater Driver | New |
| 13 | VA271BA60 | LOT of 3 pcs of Varistors | New | |
| 14 | AMAT | 3870-01310 | Valve Purge Push Button for AMAT Loadlock | New |
| 15 | AMAT | 0242-32838 | Smoke Detector and Controller | New |
| 16 | 1200-01394 | Earth Leakage Protective Relay SET | New | |
| 17 | PROVAC | - | CTI-CRYOGENICS 9600 Compressor | OEM Used |
| 18 | PROVAC | - | CTI Cryo-Torr 8F OB Cryo Pump | OEM Used |
| 19 | 0250-05609 | GATE VALVE(ENDURA PVD) | 2nd New | |
| 20 | AMAT | 0250-05609 | GATE VALVE | OEM Used |
| 21 | - | VHP ROBOT | 2nd New | |
| 22 | 0010-17351 | Walking Beam of AMAT Mirra Mesa® | 2nd New | |
| 23 | 201-822-005 | RORZE SMIF Elevator for AMAT Mirra Mesa® | 2nd New | |
| 24 | Rorze | RT107-1201-002 | X-Axis Control Unit included,CURT-126-0 | OEM Used |
| 25 | 0190-77116 | Flexible Disk | OEM Used | |
| 26 | Kaydon | SME0110A | Kaydon Bearings | OEM New |
| 27 | Yaskawa | SGMS-50A6AB | SGMS-50A6AB Servo Motor | OEM New |
| 28 | SP140p-MX1-10 | Wittenstein Planetary Gearhead 121-OAM 10 to 1 Ratio | OEM New | |
| 29 | PV1-44 | Needle valves | 2nd New | |
| 30 | 0190-35076 | POWER SUPPLY DRAWER 5200 | 2nd New | |
| 31 | 275185 | MKS Convectron Gauge | OEM New | |
| 32 | 0100-77001 | MIRRA® Backplane Board (Obsolete) | 2nd New | |
| 33 | THK | HSR20HA2SSM | THK Linear Guide | 2rd New |
| 34 | 0100-35034 | STEPPER DRIVER PWER DISTRIBUTION BD | 2nd New | |
| 35 | 0100-35063 | Contact Relay Driver Board | 2nd New | |
| 36 | 0100-75548 | CHAMBER DI/O BACKPLANE | 2nd New | |
| 37 | KLA | 710-404368-00 | KLA ALIB1 Board | OEM Used |
| 38 | KLA | 712-404056-00 | KLA Motor CPU 4MB With 1MP EP Ran | OEM Used |
| 39 | KLA | MATROX IM-CLD | MATROX IM-CLD/AT BOARD 377-01 | OEM Used |
| 40 | KLA | 710-679821-00 | KLA ZPLL2 | OEM Used |
| 41 | KLA | 710-404338-00 | KLA PCB Board | OEM Used |
| 42 | KLA | 710-404228-00 | KLA Limit Breakout Board | OEM Used |
| 43 | KLA | 710-650201-20 | KLA BASEPLATE FLEX | OEM Used |
| 44 | KLA | 710-653699-20 | KLA MIB BOARD | OEM Used |
| 45 | KLA | 710-651090-20 | KLA OPTICS INT | OEM Used |
| 46 | KLA | 710-451730-00 | KLA ENCODER INTERFACE | OEM Used |
| 47 | KLA | 710-658340-20 | KLA ROBOT Z BOARD | OEM Used |
| 48 | KLA | 710-404144-00 | KLA PZTFED | OEM Used |
| 49 | KLA | 710-659603-20 | KLA Y-SAC Single Axis Controller | OEM Used |
| 50 | KLA | 712-404561-00 | KLA MM6326 8M Main Memory | OEM Used |
| 51 | KLA | 710-652010-20 | KLA Single Axis Controller Board | OEM Used |
| 52 | KLA | 710-500101-20 | KLA MIB ASSY | OEM Used |
| 53 | KLA | 710-650074-20 | KLA ZPLL BOARD | OEM Used |
| 54 | KLA | 710-658770-20 | KLA Single X-Axis Controller | OEM Used |
| 55 | KLA | 710-659846-00 | KLA XFLEX3 BOARD | OEM Used |
| 56 | KLA | 710-404146-00 | KLA Extension board | OEM Used |
| 57 | KLA | 710-650094-20 | KLA VAC BOARD | OEM Used |
| 58 | KLA | 710-657600-20 | KLA AUTO FOCUS BOARD | OEM Used |
| 59 | KLA | 710-650204-20 | KLA Y-Flex | OEM Used |
| 60 | KLA | 710-650879-20 | KLA DUAL STEPPER DRIVER | OEM Used |
| 61 | KLA | 710-657231-20 | KLA NSC2 | OEM Used |
| 62 | KLA | 710-658161-20 | TDI SENSOR BOARD ASSY | OEM Used |
| 63 | KLA | 710-404556-00 | KLA DRIVER BOARD | OEM Used |
02.
| No | Maker | P/N | Description | Condition |
| 1 | 0100-76124 | AMAT MIRRA MESA® System Controller | 2nd New | |
| 2 | CMP MIRRA MESA® | 2nd New | ||
| 3 | New PC type with New Window OS TL FABs® | 2nd New | ||
| 4 | CMP MIRRA® POLISHER | 2nd New | ||
| 5 | Ebara® EPO-222A | 2nd New | ||
| 6 | CMP MESA® CLEANER | 2nd New | ||
| 7 | Centura® Ultima Standard | OEM As is | ||
| 8 | Centura® DxZ | 2nd New | ||
| 10 | Endura® 5500 Mainframe | 2nd New | ||
| 11 | Centura® PVD | Used, Deinstalled | ||
| 12 | Endura® 5500 Main AC Rack | OEM Refurbished | ||
| 13 | Endura® 5500 Generator Rack | 2nd New | ||
| 14 | Endura® 5500 System Controller | 2nd New | ||
| 15 | Endura® 5500 PVD System | 2nd Refurbished | ||
| 16 | Centura® DPS+ Metal | OEM Refurbished | ||
| 17 | Centura® DPS+ Poly | 2nd New | ||
| 18 | Centura® Super E | 2nd New | ||
| 19 | Centura® eMax | Refurbished | ||
| 20 | Nikon | Nikon NSR-S204B KrF Scanner | OEM As-is | |
| 21 | CANON | CANON FPA-3000i4 | OEM As-is | |
| 22 | Nikon | Nikon NSR-2205 i12D | OEM As-is | |
| 23 | Nikon | Nikon NSR-2205 EX14C | OEM As-is | |
| 24 | Nikon | Nikon NSR-2205 EX14C | OEM As-is | |
| 25 | TEL | TEL Mark 7 | OEM As-is | |
| 26 | ASML | ArF Immersion XT-1700Fi | OEM As-is | |
| 27 | ASML | AT850 | OEM As-is |
03.
| Tool # | ETSG No | RV Tool ID | Process | OEM | Model | Configuration (chambers) |
| 1 | E10-0001 | LMA5H1 | II/SPT | AG | HP8800#244 | |
| 2 | E10-0119 | LMA5H2 | II/SPT | Mattson (Steag on nameplate) | HP8800 | |
| 3 | E10-0002 | LMA5H3 | II/SPT | AG | HP8800#419 | |
| 4 | E10-0164 | LMA5H4 | II/SPT | Steag RTP System | HP8800#525 | |
| 6 | E10-0013 | ASH1C8 | Dry Etch | Alcantec/Canon | MAS-8200 | 2 chambers, 1 generator -LD: 2ea, No modification |
| 7 | E10-0009 | ASH1C3 | Dry Etch | Alcantec/Canon | MAS-8000 | 1 chamber lite etch CF4 LD: 1ea, Asyst, different type |
| 8 | E10-0008 | ASH1C2 | Dry Etch | Alcantec/Canon | MAS-8200 | 2 chambers, 1 generator -LD: 1ea, modified to Asyst |
| 9 | E10-0014 | ASH1C9 | Dry Etch | Alcantec/Canon | MAS-8200 | 2 chambers, 1 generator - LD: 2ea, No modification |
| 10 | E10-0007 | ASH1C1 | Dry Etch | Alcantec/Canon | MAS-8220 | 2 chambers, 2 generators Chamber: 2ea Ashing, 2ea Cooling LD: 1+1ea(2 type), Asyst -> ver1.1.1.1 |
| 11 | E10-0010 | ASH1C5 | Dry Etch | Alcantec/Canon | MAS-8220 | 2 chambers, 2 generators Chamber: 2ea Ashing, 2ea Cooling LD: 1+1ea(2 type), Asyst -> ver1.1.1.1 |
| 12 | E10-0011 | ASH1C6 | Dry Etch | Alcantec/Canon | MAS-8220 | 2 chambers, 2 generators LD: 2ea, modified to Asyst -> ver1.2.0.0 |
| 13 | E10-0012 | ASH1C7 | Dry Etch | Alcantec/Canon | MAS-8220 | 2 chambers, 2 generators LD: 2ea, Asyst -> ver1.1.1.1 |
| 14 | E10-0015 | ASH1CA | Dry Etch | Alcantec/Canon | MAS-8220 | 2 chambers, 2 generators LD: 2ea(?), no midification Pump: 2ea -> ver1.2.0.0 |
| 15 | E10-0019 | DRO1EZ | Dry Etch | AMAT | Centura MXP Etch | 1 EMAX, 2 Super E, 1 MXP, 1 Orienter |
| 18 | E10-0026 | LMA5C1 | II/SPT | AMAT | Centura RTP | 2 Chambers RTP XE +, 2 Cool Down |
| 19 | E10-0027 | LMA5C2 | II/SPT | AMAT | Centura RTP | 2 Chambers RTP Xe, 2 Cool Down |
| 20 | E10-0028 | LMA5C3 | II/SPT | AMAT | Centura RTP | 2 Chambers RTP Xe, 2 Cool Down |
| 22 | E10-0029 | LPW2W1 | DCVD | AMAT | Centura MCVD | 2 Chamber WxZ, 1 Orienter/degas, Preclean 23.11.08 Not sure if there is Pre Clean, robot is HP+ |
| 23 | E10-0020 | DRP1P2 | Dry Etch | AMAT | CenturaII DPS | 3 chamber DPS Poly, 1 Orienter/degas |
| 24 | E10-0021 | DRP1P3 | Dry Etch | AMAT | CenturaII DPS | 3 chamber DPS Poly, 1 Orienter /degas |
| 25 | E10-0022 | DRP1P5 | Dry Etch | AMAT | CenturaII DPS | 2 chamber DPS Poly, 1 Orienter/degas |
| 26 | E10-0023 | DRP1P6 | Dry Etch | AMAT | CenturaII DPS | 3 chamber DPS Poly, 1 Orienter/degas 23.11.08 2 chambers converted to 8 inch mm Ceramic E |
| 27 | E10-0024 | DRP1PZ | Dry Etch | AMAT | CenturaII DPS | 300mm DPS Metal chamber with 200mm ESC Mainframe: 300mm |
| 30 | E10-0018 | DRN1E1 | Dry Etch | AMAT | Centura e-MAX | 2 Chamber Emax, 1 Orienter/degas |
| 44 | E10-0016 | CMW3P3 | Wet/CMP | AMAT | CMP 5201 (Mirra-3400) | 4 Titian 1 heads, 2 plantens |
| 45 | E10-0017 | CMW3P5 | Wet/CMP | AMAT | CMP 5201 (Mirra-3400) | 4 Titian 1 heads, 2 plantens |
| 49 | E10-0154 | WSA3AZ | Wet/CMP | Semitool Raider | R208FMC2[2MEG2SA]08[RCA]S | 4 bowls, 2ea LD Chem cabinet, Ozone Gen., Pump, Chiller |
| 50 | E10-0025 | ISP7A2 | Metrology | AMAT | SEMVision G2 | Inspection LD: 2ea, Asyst |
| 51 | E10-0030 | LSN2G1 | DCVD | AMAT | SiNgen Centura | 3 chambers SiNgen, 2 orienter/ EMP cool down |
| 54 | E10-0034 | SPT5A1 | II/SPT | ANELVA | ILC-1060 SVII Plus-1 | See attachment PVD Config Chamber: 6ea, 4+1ea PM(1ea is Etch), 1ea heat LD: 2ea, Fortrend |
| 55 | E10-0035 | SPT5A2 | II/SPT | ANELVA | ILC-1060 SVII Plus-1 | See attachment PVD Config Chamber: 6ea, 4+1ea PM(1ea is Etch), 1ea heat LD: 2ea, Fortrend |
| 56 | E10-0037 | SPT5A4 | II/SPT | ANELVA | ILC-1060 | See attachment PVD Config |
| 57 | E10-0036 | SPT5A3 | II/SPT | ANELVA | ILC-1080 PVD (Cosmos 200) | See attachment PVD Config Chamber: 4ea, 2+1ea PM, 1ea buffer LD: 3ea |
| 58 | E10-0038 | SPT5A5 | II/SPT | ANELVA | ILC-1080 PVD (Cosmos 200) | See attachment PVD Config Chamber: 5ea, 3+1ea PM, 1ea buffer LD: 3ea Pump: 2ea, cryo pump compressor, Anelva P-876CA-B |
| 59 | E10-0031 | DRN1I1 | Dry Etch | ANELVA | ILD-4100 | 2 etch chamber LD: 2ea, Asyst Pump: Ebara, A10S |
| 60 | E10-0032 | DRN1I2 | Dry Etch | ANELVA | ILD-4100 | 2 etch chamber LD: 2ea, Asyst |
| 61 | E10-0033 | No Production code | Dry Etch | ANELVA | ILD-4100SR | 2 Chamber Nitride Etch |
| 62 | E10-0040 | SVTC Stored | DCVD | ASML | AVP BTBAS | LPCVD Verticle Furnace |
| 63 | E10-0039 | PCO2E1 | DCVD | ASM | EAGLE-10 | 2 Chamber: PE CVD |
| 64 | E10-0041 | BSM5X2 | II/SPT | AST | PEVA-900E E-Gun evaporator | 4 crucible turret, planetary wafer system Advanced System Technology(CN, 聚昌科技) |
| 65 | E10-0042 | BSM5X3 | II/SPT | AST | PEVA-900E E-Gun evaporator | 4 crucible turret, planetary wafer system Advanced System Technology(CN, 聚昌科技) -> with CTI compressor, Telemark Power supply, clean table |
| 66 | E10-0043 | ALD2AZ | DCVD | Aviza | Celsior (ALD-Celsior FXP) | 2 Chamber ALD: 1 Ox, 1 Metal Chamber: PM1 ADL Hi K, PM2 ALD Metal TM: Robot Brooks, MagnaTran7 LD: 2ea, Brooks Pump: 2ea, Edwards, IH1000 Acc: MKS Ozone, |
| 68 | E10-0165 | RVP2RZ | DCVD | SVG | RVP-9000 | LPCVD Verticle Furnace |
| 70 | E10-0044 | APM2J1 | DCVD | Aviza | WJ-999R CVD | Atmospheric Depo LD: 3ea, no modification |
| 73 | E10-0045 | IIH5S2 | II/SPT | Axcelis | NV-GSD III | See attachment for Ion Implant Mainframe: Chamber: LD: 1ea, outer, Asyst, 4ea original Pump: |
| 74 | E10-0073 | IIM5M1 | II/SPT | Eaton | NV-GSD/HE | See attachment for Ion Implant 23.11.08 Original 6 inch, converted to 8 inch |
| 75 | E10-0074 | IIM5M2 | II/SPT | Eaton | NV-GSD-HE | See attachment for Ion Implant |
| 76 | E10-0046 | MRF7B1 | Metrology | Beckman | DU650i | |
| 77 | E10-0085 | WST7I1 | Metrology | Irvine Optical Co. | SCS-3000 | Brooks SC3000 wafer sorter Irvine Optical Co. is Brooks Automation Sorter Biz unit |
| 78 | E10-0047 | WST7I2 | Metrology | Brooks | WaferSorter | Brooks SCS3000 wafer sorter |
| 79 | E10-0048 | WST7I3 | Metrology | Brooks | WaferSorter | Brooks SC3000 wafer sorter |
| 80 | E10-0086 | WST7I4 | Metrology | Irvine Optical Co. | SCS-3000 | Brooks SC3000 wafer sorter |
| 81 | E10-0049 | BSM5X1 | II/SPT | CHA | SEC-1000-RAP | -> with Power supply, CTI compressor, Ebara pump 23.11.08 John D. Special Evaporator. |
| 82 | E10-0050 | LMK7Q3 | Dry Etch | Coherent | Waferlase ID200 | |
| 85 | E10-0051 | OVN104 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 86 | E10-0052 | OVN106 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 87 | E10-0053 | OVN107 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 88 | E10-0054 | OVN108 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 89 | E10-0055 | OVN109 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 90 | E10-0056 | OVN110 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 91 | E10-0057 | OVN111 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 92 | E10-0058 | OVN112 | Sort | Despatch | LCC1-87N-2 | Sort wafer bake oven |
| 94 | E10-0059 | BGX3X2 | Wet/CMP | Disco | DFG840 | 2 grind tables |
| 95 | E10-0060 | BGX3X3 | Wet/CMP | Disco | DFG841 | 2 grind tables |
| 96 | E10-0061 | CSC0P1 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 97 | E10-0062 | CSC0P2 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 98 | E10-0063 | CSC0P4 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 99 | E10-0064 | CSC0P6 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 100 | E10-0065 | CSC0P7 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 101 | E10-0066 | CSW0P3 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 102 | E10-0067 | CSW0P5 | Wet/CMP | DNS | AS-2000 | Dual brush and top side brush chambers, spin dry |
| 103 | E10-0071 | WPO3D1 | Wet/CMP | DNS | SR-2000-A (Aquaspin) | 4 cup Solvent PR stripper -> 2LD modified (Fortrend) |
| 104 | E10-0072 | WPO3D2 | Wet/CMP | DNS | SR-2000-A (Aquaspin) | 4 cup Solvent PR stripper |
| 105 | E10-0068 | SCR2D1 | Wet/CMP | DNS | SS-W80A-AR | |
| 106 | E10-0069 | SCR2D2 | Wet/CMP | DNS | SS-W80A-AR | |
| 107 | E10-0070 | SCR2D3 | Wet/CMP | DNS | SS-W80A-AR | |
| 108 | E10-0075 | BCC3L2 | Wet/CMP | Enya | Box Washer | Conveyer system to clean Sort lot boxes, casettes, etc |
| 109 | E10-0076 | PBR708 | Sort | FTS / TEL | FTI-1000 (Test) P-8XL (Prove) | High voltage tester + prober |
| 110 | E10-0077 | DRA1H1 | Dry Etch | Hitachi | M-602A | 2 Etch, 2 strip LD: 2ea, Fortrend Punp: 6ea, 4+2, Ebara, AA40W, AA10 |
| 111 | E10-0078 | DRA1H2 | Dry Etch | Hitachi | M-602A | 2 Etch, 2 strip LD: 2ea, Fortrend |
| 112 | E10-0079 | MCD7H1 | Metrology | Hitachi | S-9220 | CD Sem 23.11.08 Converted to 6 inch, Clear Wafer |
| 113 | E10-0081 | MCD7H4 | Metrology | Hitachi | S-9220 | CD Sem |
| 114 | E10-0082 | MCD7H5 | Metrology | Hitachi | S-9220 | CD Sem |
| 115 | E10-0080 | MCD7H3 | Metrology | Hitachi | S-9200 | CD Sem |
| 116 | E10-0087 | MWT7V1 | Metrology | Iwatsu | ST-0505 | Thickness meter |
| 117 | E10-0088 | ISP7J1 ( 7E1 part of) | Metrology | JEOL | JWS-7555 | Inspection with EDAX LD: 1ea, Fortrend |
| 118 | E10-0089 | WAO3E1 | Wet/CMP | Kaijo | RT-1033T | 3 BHF (20C), HF/H2O2 at 20C) 4 DIW tanks, 1 Marangoni Dryer Pre-dopos etcher LD/ULD modify (Shinko) |
| 119 | E10-0093 | WSA3A1 | Wet/CMP | Kaijo | RT-1035T/SR-206 | 2 SC1 tanks(65C), 1 piranha (110C), 2 DIW tanks, Spin Dry -> 4LD modify (Shinko) |
| 120 | E10-0094 | WSA3A2 | Wet/CMP | Kaijo | SRT-206 | Carrierless, SC1 (65C), 2 piranha (110C/140C), Spin Dry -> 4LD modify (Shinko) |
| 121 | E10-0091 | WPA3R1 | Wet/CMP | Kaijo | RT-1041T | 2 piranha (140C), 2 SC1 (65C) 3 Hot DIW rinse (65C) Spin Dry -> 4LD modify (Shinko) |
| 122 | E10-0092 | WPA3R2 | Wet/CMP | Kaijo | RT-1041T | |
| 123 | E10-0163 | WHM3H1 | Wet/CMP | Steag Microtech | Marangoni Dryer | 1 SC2 tank 45C, 1 High Concentration SC1, tank 25C, 2 DIW tanks, Maragoni dryer |
| 124 | E10-0090 | WBR3J1 | Wet/CMP | Kaijo | RT-575 | 2 SC1 tanks (35C and 65C) 2 DIW tanks, Spin Dryer -> 2LD modify (Shinko) |
| 125 | E10-0100 | MAI7K3 | Metrology | KLA/Ten | AIT III | LD: Asyst modified |
| 126 | E10-0096 | IRC7C1 | Metrology | KLA/Ten | Archer-10 | |
| 127 | E10-0103 | MST7YZ | Metrology | KLA/Ten | Flexus2320 | Thin film stress measure |
| 129 | E10-0104 | MTE7U1 | Metrology | KLA/Ten | FT750 | |
| 130 | E10-0101 | MRH7Y2 | Metrology | KLA/Ten | HRP-240 | |
| 131 | E10-0099 | MAI7K2 | Metrology | KLA/Ten | KLA-2367-IS | Automatic defect inspection |
| 132 | E10-0107 | RPC4R1 | Metrology | KLA/Ten | KLA-301 (IC) | |
| 133 | E10-0097 | IRC7C2 | Metrology | KLA/Ten | KLA-51XX | LD: 2ea, Asyst 23.11.08 Installed as 6 inch, converted to 8 inch |
| 134 | E10-0098 | IRC7C3 | Metrology | KLA/Ten | KLA5200 | LD: 2ea, Asyst 23.11.08 Installed as 6 inch, converted to 8 inch |
| 136 | E10-0102 | MRH7Y3 | Metrology | KLA/Ten | P 2H | |
| 137 | E10-0095 | MCG7Z1 | Metrology | Keithley | 64000 | Charge monitor, Oxide quality |
| 144 | E10-0106 | MTE7U8 | Metrology | KLA/Ten | Auto SM300 | Model#: 289108 (same as 7K4) |
| 147 | E10-0105 | MTE7U3 | Metrology | KLA/Ten | UV-1050 (Prometrix) | |
| 150 | E10-0111 | UMCJ Crated | DCVD | Kokusai | DJ-825V | Single tube furnace |
| 151 | E10-0110 | LPH2K1 | DCVD | Kokusai | DJ-853V | LPCVD Verticle Furnace |
| 152 | E10-0108 | DI96K1 | DCVD | Kokusai | DD-853V | Single tube furnace High temp. Oxide |
| 153 | E10-0109 | DI96K2 | DCVD | Kokusai | DD-853V | Single tube furnace High temp. Oxide |
| 155 | E10-0114 | OVI101 | PR | Koyo Lindberg | CLH-21CD | Baking gold, Not enough infor. In pictures 23.11.08 6 inch config. |
| 156 | E10-0112 | No Production code | PR | Koyo Lindber | Koyo Oven | Wafer Inspection Probably oven like other 2 tools |
| 157 | E10-0115 | DRA1LZ | Dry Etch | LAM | 9600 | Etch, Strip, water chambers |
| 158 | E10-0161 | WBE3Z4 | Wet/CMP | SEZ | SEZ 203 | HF and 70BE |
| 159 | E10-0162 | WBE3ZZ | Wet/CMP | SEZ | SP203-8-B/F | Backside clean, Al etch TDCS(?) use only |
| 160 | E10-0116 | RSN7L1 | Metrology | Leica | INS2000 | |
| 161 | E10-0117 | LMK7Q2 | Metrology | Lumonics | WMDCS | Marker |
| 162 | E10-0118 | ASH1M1 | Dry Etch | Mattson | Aspen | Dual Chamber Strip Seems LD is small than 8inch wafer Pump: 2ea, Kashiyama, SDE603X Acc: 4ea RF Gen., |
| 163 | E10-0121 | WEX7S9 | Metrology | MGI Automation | EET10395F-2-U | Wafer exchanger |
| 164 | E10-0120 | WEX7S1 | Metrology | MGI Automation | EET10395F-2-U | Wafer exchanger |
| 165 | E10-0122 | DES6Z1 | Metrology | Multi | Dessicator | Plastic Box with N2 Purge |
| 166 | E10-0123 | DES6Z2 | Metrology | Multi | Dessicator | Plastic Box with N2 Purge |
| 167 | E10-0124 | DES6Z3 | Metrology | Multi | Dessicator | Plastic Box with N2 Purge |
| 168 | E10-0113 | LMK7Q1 | Dry Etch | Koyo Lindberg | SL473E | YAG Rod Laser Marker |
| 173 | E10-0128 | STE4K1 | PR | Nikon | NSR-EX14C | Step and Repeat System Cymer: ELS5400, SN: 98SA467001, Vintage: 1998.01.20 |
| 174 | E10-0129 | STE4K2 | PR | Nikon | NSR-EX14C | Step and Repeat System Cymer: ELS5400, SN: Unknown, Vintage: Unknown |
| 175 | E10-0131 | STP802 (401D-49) | PR | Nikon | NSR-i11C | Step and Repeat System 23.11.08 Converted from 6 to 8 inch |
| 181 | E10-0130 | STP801 (4G1) | PR | Nikon | NSR-i9C | Step and Repeat System |
| 182 | E10-0125 | SCK4S1 | PR | Nikon | NSR-S204B | Laser Scanner Cymer: ELS-6400, SN:01SA489408, Vintage:2001.08.09 |
| 183 | E10-0127 | SCK4S3 | PR | Nikon | NSR-S205C | Laser Scanner |
| 184 | E10-0126 | SCK4S2 | PR | Nikon | NSR-S206D | Laser Scanner Gigaphoton: |
| 191 | E10-0134 | IIM5N2 | II/SPT | Nissin | Exceed 2000A | See attachment for Ion Implant |
| 192 | E10-0135 | IIM5N3 | II/SPT | Nissin | Exceed 2000A | See attachment for Ion Implant |
| 193 | E10-0133 | IIM5N1 | II/SPT | Nissin | Exceed 2000AH | See attachment for Ion Implant |
| 194 | E10-0138 | SRT3T2 | Wet/CMP | Nitto Denko | DR8500-II | Wafer Taping pre-backgrind |
| 196 | E10-0137 | SRT3T1 | Wet/CMP | NITTO | NEL-DR8500II | Wafer Taping pre-backgrind |
| 197 | E10-0136 | SRB3B1 | Wet/CMP | NITTO | NEL-HR8500II | Wafer tape removing post-backgrind |
| 198 | E10-0146 | PHO2HZ | DCVD | Novellus | Concept Two Speed | 1 Chamber running, 1 chamber ready for install, 1 chamber parts Chamber: 1+1ea (1is installed, 1 not exist, but power units exist) LD: 2ea, no modification Pump: 1+2ea, Edwards, 23.11.08 1 PM ready, 1 PM ready to install |
| 199 | E10-0144 | PCO2NY | DCVD | Novellus | Concept One | 1 chamber, system type: Nit/Oxide Ver. 4.431 Pump: 1ea, Ebara, A10S Acc: 1+1ea RF Gen.(High, Low, both off) |
| 200 | E10-0145 | PCO2NZ | DCVD | Novellus | Concept One | 1 chamber type: Nitride/TEOS Ver. 4.431 ECO 4.43 Pump: 1ea, Ebara, A10S |
| 201 | E10-0141 | PCO2N1 | DCVD | Novellus | C2 | Dual Sequel TEOS, Non Shrink |
| 202 | E10-0142 | PCO2N2 | DCVD | Novellus | C2 | Dual Sequel TEOS, Non Shrink |
| 203 | E10-0143 | PCO2N3 | DCVD | Novellus | C2 | Dual Sequel TEOS, Non Shrink |
| 204 | E10-0140 | LPW2NB | DCVD | Novellus | C2 Altus | Dual Altus, Non Shrink 23.11.08 1 chamber standard, 1 chamber PNL Mod s |
| 205 | E10-0139 | LPW2NA (245-2) | DCVD | Novellus | C2 Altus | Dual Altus, Non Shrink |
| 207 | E10-0147 | MPB7P2 | Metrology | Phillips | SPW-2800 | |
| 208 | E10-0148 | MPB7P3 | Metrology | Phillips | PW-2830 | XRF Wafer Scan |
| 209 | E10-0149 | MTE7U4 | Metrology | Rudolph | FE-VII-SD | |
| 210 | E10-0150 | MTE7U6 | Metrology | Rudolph | FE-VII-D | |
| 211 | E10-0151 | MTM7R1 | Metrology | Rudolph | MetaPulse MP300X Cu | |
| 216 | E10-0153 | WPO3SY | Wet/CMP | Semitool | WST308A(1CC)BT | 1 bowl, 2 tanks |
| 217 | E10-0152 | BCC3Q1 | Wet/CMP | Semitool | Storm III | Multi ladder system to clean 200mm cassettes and SMIF Pod base and top |
| 218 | E10-0157 | IIH5S4 | II/SPT | SEN | GSD-III 180 | See attachment for Ion Implant GSD180 LD: No modification |
| 219 | E10-0155 | IIH5S1 | II/SPT | SEN | NV-GSD-LED | See attachment for Ion Implant LD: 3ea, modified to Asyst |
| 220 | E10-0156 | IIH5S3 | II/SPT | SEN | NV-GSD-LED | See attachment for Ion Implant LD: 2ea, modified to Asyst |
| 221 | E10-0158 | WBE3Z1 | Wet/CMP | SEZ | SP203-8-B | 49% HF at 55C, 49% HF at 25C, 70 BE at 30 C LD: 2ea, Fortend modified |
| 222 | E10-0159 | WBE3Z2 | Wet/CMP | SEZ | FRM203-8-B/F | 3 mediums: HFx1, 70BEx2 LD: 2ea, Fortend modified |
| 223 | E10-0160 | WBE3Z3 | Wet/CMP | SEZ | SEZ203 | 3 mediums: HFx1, 70BEx2 LD: 2ea, Fortend modified |
| 226 | E10-0223 | RXC4T1 | PR | Toray | No data on nameplate | Reticle Transfer Syset |
| 227 | E10-0167 | MRX7F3 | Metrology | Technos | TR620T[6220] | |
| 228 | E10-0166 | MRX7F2 | Metrology | Technos | TR620T[6228] | |
| 229 | E10-0168 | No Production code | Dry Etch | Tegal | Etch 6500 | |
| 230 | E10-0169 | No Production code | Dry Etch | Tegal | Etch 6500U | Single Chamber -> Probably 2PM (HRe 2.1&4.0) |
| 231 | E10-0170 | DI16F1 | DCVD | TEL | a-8 | LPCVD Verticle Furnace- Need Temperture Range |
| 232 | E10-0171 | DI16F2 | DCVD | TEL | a-8 | LPCVD Verticle Furnace- Need Temperture Range |
| 233 | E10-0199 | LPC2T4 | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 234 | E10-0200 | LPC2T9 | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 235 | E10-0201 | LPC2TC | DCVD | TEL | a-8S-Z | LPCVD Verticle Furnace- Need Temperture Range |
| 236 | E10-0205 | LPN2T0 | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 237 | E10-0206 | LPN2TG | DCVD | TEL | a-8S-Z | LPCVD Verticle Furnace- Need Temperture Range |
| 238 | E10-0207 | LPP2T2 | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 239 | E10-0208 | LPP2TE | DCVD | TEL | a-858SC | LPCVD Verticle Furnace- Need Temperture Range |
| 240 | E10-0209 | LPT2T3 | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 241 | E10-0210 | LPT2TA | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 242 | E10-0173 | DI46H2 | DCVD | TEL | a-8S-D | LPCVD Verticle Furnace- Need Temperture Range |
| 243 | E10-0174 | DI46H3 | DCVD | TEL | a-8S-D | LPCVD Verticle Furnace- Need Temperture Range |
| 244 | E10-0179 | DIA6P1 | DCVD | TEL | a-8S-D | LPCVD Verticle Furnace- Need Temperture Range |
| 245 | E10-0180 | DIA6P2 | DCVD | TEL | a-8S-D | LPCVD Verticle Furnace- Need Temperture Range |
| 246 | E10-0203 | LPH2T5 | DCVD | TEL | a-8S-C | LPCVD Verticle Furnace- Need Temperture Range |
| 247 | E10-0204 | LPH2TB | DCVD | TEL | a-8S-Z | LPCVD Verticle Furnace- Need Temperture Range |
| 248 | E10-0172 | DI46H1 | DCVD | TEL | a-8S-Z | Diffusion Furnace, torch w/ heater |
| 249 | E10-0212 | OVI6L1 | DCVD | TEL | a-8S-D | LPCVD Verticle Furnace- Need Temperture Range |
| 251 | E10-0213 | PCD0S1 | PR | TEL | ACT8 | 3 Develop, 2 coat cups, WEE, 3 Chill plates, 3 Chill/hot plates, 6 Precision chill/hot plates, 2 adhesion units, 2 cup washer Right, 2C, 2+?D, 2AD, 1PHP, 4HHP, 2LHP, 3CHP, 5PCH, 4CPL, 2CWH, 2TRS Mainframe : Dual Block LD: no modification |
| 252 | E10-0214 | PCD0S2 | PR | Nikon | Nikon NSR-i12 i-Line Wafer Stepper | Step and Repeat |
| 253 | E10-0215 | PCD0S3 | PR | TEL | ACT8 | 2 coat, 3 develop, WEE, 8 Chill hot plates, 4 low temp hot plates, 4 chill plates, 2 adhesion units, 1 cup wash Left, 4C, 4D, 2AD, 8PHP, 2HHP, 8LHP, 8HCP, 2HSH, 1CWH, 3TRS Mainframe : Dual Block LD: 2ea modified to Asyst |
| 256 | E10-0175 | DI46H4 | DCVD | TEL | Alpha 808SD | LPCVD Verticle Furnace- Need Temperture Range |
| 257 | E10-0176 | DI46H5 | DCVD | TEL | Alpha 808SD | LPCVD Verticle Furnace- Need Temperture Range |
| 258 | E10-0202 | LPC2TF | DCVD | TEL | Alpha 808SC | LPCVD Verticle Furnace- Need Temperture Range |
| 259 | E10-0177 | DI46H6 | DCVD | TEL | Alpha 808SD | LPCVD Verticle Furnace- Need Temperture Range |
| 260 | E10-0178 | DI66C1 | DCVD | TEL | a-8S-ZA | LPCVD Verticle Furnace- Need Temperture Range |
| 277 | E10-0195 | GMP102 | Sort | Tel | P-8 | Prober |
| 278 | E10-0196 | GMP201 | Sort | Tel | P-8 | Prober |
| 279 | E10-0197 | GMP202 | Sort | TEL | P-8XL | Prober |
| 280 | E10-0198 | GMP204 | Sort | Tel | P-8 | Prober |
| 281 | E10-0193 | DRP1T2 | Dry Etch | TEL | TE-8401 | Single Chamber |
| 282 | E10-0194 | DRP1T3 | Dry Etch | TEL | TE8401 | Single Chamber LD: 2ea, no modification Pump: 2ea |
| 283 | E10-0211 | No Production code | Dry Etch | TEL | TE8401 | 1 chamber Poly Etch |
| 284 | E10-0191 | DRO1T1 | Dry Etch | TEL | TE8500PESC | 1 chamber LD: 2ea, Fortrend Pump: 2ea, Ebara, A30W |
| 285 | E10-0192 | DRO1T4 | Dry Etch | TEL | TE8500P | 1 chamber LD: 2ea, no modification Pump: 2ea, Kashiyama |
| 286 | E10-0190 | DRO190 | Dry Etch | TEL | Unity DRM (U2e-855DD) | 2 chamber Unity2 DRM |
| 287 | E10-0186 | DRO186 | Dry Etch | TEL | Unity DRM (U2e-855DD) | 2 chamber Unity2 DRM |
| 288 | E10-0188 | DRO188 | Dry Etch | TEL | Unity DRM (U2e-855DD) | 2 chamber Unity2 DRM |
| 289 | E10-0187 | DRO187 | Dry Etch | TEL | UNITY85DI (U2S-855II) | 2 Chamber, IEM |
| 290 | E10-0185 | DRO185 | Dry Etch | TEL | UNITY85DI (U2S-655II) | 2 Chamber, IEM: Chambers Final |
| 291 | E10-0182 | DRO182 | Dry Etch | TEL | UNITY85DI (U2S-855II) | 2 Chamber, IEM, Chambers: Standard & Final |
| 292 | E10-0183 | DRO183 | Dry Etch | TEL | UNITY85DI (U2S-855II) | 2 Chamber, IEM, Chambers: COC & Final |
| 293 | E10-0184 | DRO184 | Dry Etch | TEL | UNITY85DI (U2S-855II) | 2 Chamber, IEM: Chambers Final |
| 294 | E10-0181 | DRO181 | Dry Etch | TEL | UNITY85DS (U2S-855II) | 2 chamber SCCM |
| 295 | E10-0189 | DRO189 | Dry Etch | TEL | UNITY85DS (U2E-855SS) | 2 chamber SCCM |
| 296 | E10-0216 | WPA3E2 | Wet/CMP | TEL | UW-200Z | piranha (130C), SC1 (65C) BHF (20C) 3 DIW, IPA Vap dry |
| 297 | E10-0217 | WSA3A3 | Wet/CMP | TEL | UW-200Z | 1 piranha 140C, 1 SC1 65C, BHF 20C, 3 DIW Tank, IPA Vap dry |
| 298 | E10-0084 | MVT6V4 | Sort | HP/TEL | 4062UX (Test) P8 (Probe) | Tester:4062UX, prober: P8 |
| 299 | E10-0005 | MVT6V5 | Sort | Agilent/TEL | E3102A (Test) P8 (Probe) | Agilent 4072A, TEL P8 Prober |
| 300 | E10-0083 | MVT6V1 | Sort | HP/TEL | E3101A (Test) P8XL (Probe) | Tester: E3101A/4071A, prober: P8XL |
| 301 | E10-0004 | MVT6V3 | Sort | Agilent/TEL | E3102A (Test) P8XL (Probe) | Agilent 4072A, TEL P8XL Prober -> couldn't find chiller, no nameplate picture |
| 302 | E10-0006 | MVT6V6 | Sort | Agilent/TEL | E3103A (Tester) P8XL (Probe) | Tester: E3103A/4073A, prober: P8XL With Chiller |
| 303 | E10-0003 | MVT6V2 | Sort | Agilent/TEL | E3103B (Test) P8XL (Probe) | Agilent 4073B,TEL P8XL Prober -> couldn't find chiller, no nameplate picture for probe (Temp. set 14C) |
| 305 | E10-0219 | MTE7T1 | Metrology | Thermawave | OPTI PROBE 2600 | |
| 306 | E10-0220 | MTE7T2 (332B-1) | Metrology | Thermawave | OP3290 | |
| 307 | E10-0218 | MDS7O1 | Metrology | Thermawave | TP-500 | Single wafer metrology for Implant |
| 308 | E10-0221 | RST4Z1 | Metrology | TIMEC | GRS-7100 | |
| 309 | E10-0222 | RST4Z2 | Metrology | TIMEC | GRS-7100 | |
| 310 | E10-0132 | INS404 | Sort | Nikon -> Toray | Optiphot-200 NWL-851 -> Inspectra 1000EX-IIL | Final visual inspection |
| 311 | E10-0224 | MSR7V2 | Metrology | TSK | Surfcom 590A | |
| 312 | E10-0225 | WMO3M1 | Wet/CMP | TYK | Etcher | Manual wet bench 3 BHF tanks (Teflon) 1 Mix tank - heated, Semitool S/D -> QDR*5, Sitek(Semitool auto rinse 1) |
| 313 | E10-0226 | WNI3N1 | Wet/CMP | TYK | ANWE-081 | 3 H3PO4 tanks at 160C, 3 Hot DIW tanks at 65C, Spin Dry -> 2LD modify (Shinko) |
| 314 | E10-0227 | UVC4U1 | PR | Ushio | UMA-1002-HC93NS | Single wafer processing with UV Bulb |
| 315 | E10-0228 | UVC4U2 | PR | Ushio | UMA-1002 | Single wafer processing with UV Bulb ->Never used, not put in to system |
| 317 | E10-0229 | DRI1VZ | Dry Etch | Veeco | RF-350S Ion Mil | Ion Mil |
| PHO2H1 | AMAT | Centura-HDP | Applied Materials Centura HDP CVD | |||
| PHO2H2 | AMAT | Centura-HDP | Applied Materials Centura HDP CVD | |||
| PHO2H5 | AMAT | Ultima HDP | Applied Materials Ultima HDP CVD | |||
| DRA1A1 | AMAT | DPS | Applied Materials DPS Centura Al Dry Etcher | |||
| DRA1A2 | AMAT | DPS | Applied Materials DPS Centura Al Dry Etcher | |||
| PCD0H3 | TEL | Mark-VIII | Tokyo Electron Mark-VIII Photoresist Coater & Developer | |||
| PCR4C1 | TEL | Mark-VIII | Tokyo Electron Mark VIII Coater | |||
| PCR4C2 | TEL | Mark-VIII | Tokyo Electron Mark VIII Coater | |||
| PCR4C3 | TEL | Mark-VIII | Tokyo Electron Mark VIII Coater | |||
| PDR0I1 | TEL | Mark-VIII | Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB | |||
| PDR0I2 | TEL | Mark-VIII | Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB | |||
| PDR0I3 | TEL | Mark-VIII | Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB | |||
| PDR0I4 | TEL | Mark-VIII | Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB | |||
| PDR0K1 | TEL | ACT8 | Tokyo Electron Act8 200mm Coater & Developer w/PEB | |||
| STD4H3 | Nikon | NSR-i12 | Nikon NSR-i12 i-Line Wafer Stepper | |||
| STD4I1 | Nikon | NSR-i14E | Nikon NSR-i14E i-Line Wafer Stepper | |||
| STD4I2 | Nikon | NSR-i14E | Nikon NSR-i14E i-Line Wafer Stepper | |||
| STD4I3 | Nikon | NSR-i14E | Nikon NSR-i14E i-Line Wafer Stepper | |||
| STD4I4 | Nikon | NSR-i14E | Nikon NSR-i14E i-Line Wafer Stepper | |||
| PCD0K2 | TEL | ACT8 | Tokyo Electron ACT8 In Line Coater/Developer | |||
| DET4D1 | TEL | MARK VIII | Tokyo Electron Mark VII Developer/Scanner w/PEB | |||
| SOD0H5 | TEL | Mark-VIII | Tokyo Electron Mark-VIII Photoresist Coater & Developer | |||
| PIA4P1 | TEL | MARK VIII | Tokyo Electron Mark VIII Polyimide Coater and Developer | |||
| MRH7Y4 | KLA/Ten | P-22 | P-22 Profilometer | |||
| INP4N2 | NIDEK | OPT-5 | NIDEK OPT-R Visual Checker | |||
| INP4N3 | NIDEK | OPT-5 | NIDEK OPT-R Visual Checker | |||
| INS4N1 | NIDEK | OPT-5 | NIDEK OPT-R Visual Checker | |||
| INS4N4 | NIDEK | OPT-5 | NIDEK OPT-R Visual Checker | |||
| MPB7P1 | Philips | SPW-2800 | Philips concentration monitors | |||
| SSU3Y0 | Megasystems | IIIC | EPD6025 Oxide Slurry distribution unit | |||
| SSU3YB | Megasystems | EPD 6025 Oxide Slurry distribution unit | ||||
| SSU3YC | SD | MFIIIB, Global Distribution W-slurry |
