IC TECH INTL LTD

Product Intro

Home >>Product Intro

Product Intro

A. 8英寸列表/8inch list.

Item	Area	Vendor	Tool Model by vendor	Tool Composition - Specific Information per Frame or Chamber	Description	S.N	Manufacturing Year
1	CMP	LAM	TERES	2 belt: L,R, 4 head		5169	2001/Apr
2	CMP	LAM	TERES	2 belt: L,R, 4 head		5175	2001/Apr
3	CMP	LAM	TERES	2 belt: L,R, 4 head		5162	2001/Apr
4	CMP	LAM	TERES	2 belt: L,R, 4 head		5157	2001/Apr
5	DIFF	TEL	Alpha-8SE-ZANRS	Furnace (Batch of 150wfr)	H2 Sinter, Furnace (Batch of 150wfr)(N2, H2)	M00000115019	2001/Mar
6	DIFF	TEL	Alpha-8SE-ZVANS	Furnace (Batch of 150wfr)	SIN-LPC-M01(N2, NH3, SiH2Cl2)	M000000Z5694	2001/Apr
7	DIFF	KOKUSAI	DJ-853V-8BL	Furnace (Batch of 75wfr)	硅烷，做氧化，CLTSIN-LPC-M01	T2DC3-12042-1	2004/Jul
8	DIFF	AMAT	XE Plus Centura	2ch	RTO (Rapid thermal oxidation)	318208	2001/Apr
9	DIFF	KOKUSAI	DJ-823V	Furnace (Batch of 150wfr)	a-Si, Furnace (Batch of 150wfr)(N2, SiH4, CIF3, AIR/N2) poly	T2DC3-11451-1	2001/Apr
10	DIFF	KOKUSAI	DJ-823V	Furnace (Batch of 150wfr)	a-Si, Furnace (Batch of 150wfr)(N2, SiH4, CIF3, AIR/N2) poly	T2DC3-11452-2	2001/Apr
11	DIFF	TEL	Alpha-8SE-ZVNS	Furnace (Batch of 150wfr)	LP-SIN, Furnace (Batch of 151wfr)，(N2, NH3, SiH2Cl2)	M000000Z5594	2001/Apr
12	DIFF	TEL	Trias-SPA	1ch	Furnace (Batch of 100wfr)	H10118	2003/Jan
13	DIFF	TEL	Alpha-8SE-ZVANS	Furnace (Batch of 100wfr)	TEOS-LPC-M02(N2, O2, TEOS)	M000000Z5589	2001/Apr
14	DIFF	KOKUSAI	DJ-823V-8BL3	Furnace (Batch of 100wfr)	BTBAS, 850°Furnace (Batch of 100wfr)(N2, NH3, I2, NF3, BTBAS)	T2DC3-11754-1	2002/Dec
15	DRY ETCH	TEL	UnityⅡe855DS	2ch SCCM:	2ch SCCM: 二氧化硅	U02153	2003/Jan
16	DRY ETCH	LAM	Alliance 9400PTX	2ch PTX:	2ch PTX:	80197	2001/Mar
17	DRY ETCH	SHIBAURA	Allegro-ICE200	2ch	2ch Photo Resist Strip	VFX0115	2002/Jul
18	DRY ETCH	SHIBAURA	Allegro-ICE200	2ch	2ch Photo Resist Strip	SFX0182	2002/Dec
19	DRY ETCH	HITACHI	U622	2ch	2ch oxide etch 二氧化硅		2003/Mar
20	DRY ETCH	TEL	UnityⅡe855DS	2ch SCCM:	2ch SCCM:	U01846	2001/Mar
21	DRY ETCH	SHIBAURA	Allegro-ICE200	2ch	2ch Photo Resist Strip	SFX0184	2000/Dec
22	Fab5 - DRY ETCH	TOK	TCA-3822	2ch:Ashing CH-1/2	Frame 去胶	T-9509372	1999/May
23	IMP	SEN	NV-GSD-LE	Frame		I01	2004/Dec
24	IMP	SEN	NV-GSD-LE	Frame		B67	2001/Apr
25	IMP	Nissin	EXCEED 2000A	Frame		F01466	2001/Apr
26	IMP	Nissin	EXCEED 2000A	Frame		F01467	2001/Apr
27	PHOTO	Canon	FPA-3000 EX6	Frame	8" Notch Giga laser(G10K-30), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit,	1035302	2001/Mar
28	PHOTO	TEL	CLEAN TRACK ACT8	Frame		D-9201719	2001/Mar
29	PHOTO	Canon	FPA-3000 EX6	Frame	8" Notch Giga laser(G10K-30), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit,	1045309	2002/Dec
30	PHOTO	TEL	CLEAN TRACK ACT8	Frame		D-9201721	2001/May
31	PHOTO	SCREEN	SC-80BW-AV	Frame		60700-3696	2001/Jan
32	PHOTO	Canon	FPA-3000 EX6	Frame	8" Notch Cymer laser(ELS-5310), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit,	1025300	2001/Feb
33	PHOTO	TEL	CLEAN TRACK ACT8	Frame		D-9201718	2001/Mar
34	PHOTO	Canon	FPA-3000 EX6	Frame	8" Notch Giga laser(G10K-30), Reticle library: 29 pcs, Reticle cassette: Canon, PPC unit,	1035311	2001/Apr
35	PHOTO	TEL	CLEAN TRACK ACT8	Frame		D-9201720	2001/Mar
36	PHOTO	Canon	FPA-3000 i5+	Frame		1012705	2001/Feb
37	PHOTO	SCREEN	SK-80BW-AVQ	Frame		60700-3713	2001/Mar
38	TF	AMAT	Centura Gigafill	3ch	3腔BPSG	309817	2001/Mar
39	TF	LAM	CONCEPT TWO	2M	SiN PECVD	00-49-C26143	2001/Mar
40	TF	ASM	EAGLE-10 Trident-3RC	3ch	PECVD (AntiReflectiveLayer)	WAJ-8512	2001/Mar
41	TF	ASM	EAGLE-10 Trident-3RC	3ch	PECVD (AntiReflectiveLayer)	WAJ-8502	2001/Mar
42	TF	ASM	EAGLE-10 Trident-3RC	3ch	PECVD (AntiReflectiveLayer)	1065	2003/Jan
43	TF	AMAT	Endura	2ch PC, 2ch Co, 1ch Ti:	2ch PC, 2ch Co, 1ch Ti:	317559PE	2001/Apr
44	TF	LAM	Sabre XT	3cell	3cell 铜电镀	CuxT0040	2001/Apr
45	TF	LAM	Concept-Two Inova	2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch:	2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch:	IC20491	2001/Apr
46	TF	LAM	Concept-Two Inova	2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch:	2ch HCM Ta(N)PVD: 1ch HCM Cu PVD: 1ch Etch:	IC20506	2003/Jan
47	TF	AMAT	Centura SA-NSG DxZ	3ch	3ch TEOS	309905	2001/Mar
48	TF	AMAT	Centura Tectra	1ch PC, 1ch Ti, 1ch TiN:	1ch PC, 1ch Ti, 1ch TiN:	319139MC	2001/Mar
49	TF	TEL	MB2-720	3ch	3ch W-si (DCS，WF6)	MCJ,160	2015/Jul
50	Fab5 - TF	AMAT	Centura 5200	3ch:WxZ CH-A/B/C	3ch W CVD	2641	1995/Oct
51	WET ETCH	TEL	PR200Z	1ch		N021062	2002/Dec
52	WET ETCH	SCREEN	SS-W80-AR	2ch Surface wet2ch Back wetNo oven	2ch Surface wet2ch Back wetNo oven	60700-3726	2001/Apr
53	WET ETCH	Dantakuma	SR20	1ch HF1ch APM1ch QDR1ch F/RS/D	1ch HF1ch APM1ch QDR1ch F/RS/D	08-SR20	2008/May
54	WET ETCH	SCREEN	FC-821L	2ch	批式多晶硅清洗	60630-2640	2001/Apr
55	WET ETCH	SCREEN	FC-821L	2ch		60630-2653	2001/Apr
56	WET ETCH	SCREEN	FC-821L	2ch		60630-2662	2001/Apr
57	WET ETCH	SCREEN	FC-821L	2ch		60630-2639	2001/Apr
58	WET ETCH	SEZ	SEZ203	Frame	单片多晶硅清洗HF,HNO3	485	2001/Apr
59	Metrology	KLA	KLA-5300	Frame	OVERLAY	3101	2001/Jan
60	Metrology	HITACHI	S-9220	Frame	CDSEM	2863989	2001/Jan
61	Metrology	KLA	Therma-Wave TP500	Frame	热波仪,离子注入和其他工艺无损非接触测量	3832	2000/Dec
62	Metrology	Veeco	D9000	Frame	AFM原子力显微镜	126	2001/Feb
63	Metrology	KLA	FLX5400	Frame	应力测量	0101-4810	2001/Jan
64	Metrology	SANYO TRADING	IR EPOCH 2500	Frame		29808	2001/Jan
65	Metrology	Olympus	AL2100	Frame		12021	2001/Jan
66	Metrology	Olympus	AL2100	Frame		12018	2000/Dec
67	Metrology	AMAT	SEM Vision cX	Frame	缺陷扫描	W828	2001/Jan
68	Metrology	HITACHI	S-9220	Frame	CDSEM	2863138	2000/Dec
69	Metrology	KLA	Optiprobe 3290/3290 DUV	Frame	FILM膜厚测量	6941	2000/Dec
70	Metrology	KLA	Optiprobe 5240AE	Frame	FILM膜厚测量	8183	2000/Dec

B.設備工具明細/Tool List：

01.

No	Maker	P/N	Description	Condition
1		-	Endura Mainframe & Monolith	2nd New
2		-	15V D.C Power Supply	2nd New
3		-	24V D.C Power Supply	2nd New
4		332102	GRANVILLE-PHILLIPS Ionization Gauge Supply	OEM
5		0010-20005	5 PHASE DRIVER BOX	2nd New
6		0010-20004	SYS ELEC EXOANDED CARD CAGE(7 SLOT)	2nd New
7		0010-20003	SYS CONTROLLER CARD CAGE	2nd New
8		0680-01470	CB PNL BD INTERIOR 30 POS 225A	2nd New
9		0680-01204	CB PNL BD INTERIOR 42 POS 225A	2nd New
10		0680-01205	CB PNL BD INTERIOR 54 POS 225A	2nd New
11	AMAT	0190-35875	DxZ Heater Driver, Single Phase	New
12	AMAT	0190-09419	WxZ Heater Driver	New
13		VA271BA60	LOT of 3 pcs of Varistors	New
14	AMAT	3870-01310	Valve Purge Push Button for AMAT Loadlock	New
15	AMAT	0242-32838	Smoke Detector and Controller	New
16		1200-01394	Earth Leakage Protective Relay SET	New
17	PROVAC	-	CTI-CRYOGENICS 9600 Compressor	OEM Used
18	PROVAC	-	CTI Cryo-Torr 8F OB Cryo Pump	OEM Used
19		0250-05609	GATE VALVE(ENDURA PVD)	2nd New
20	AMAT	0250-05609	GATE VALVE	OEM Used
21		-	VHP ROBOT	2nd New
22		0010-17351	Walking Beam of AMAT Mirra Mesa®	2nd New
23		201-822-005	RORZE SMIF Elevator for AMAT Mirra Mesa®	2nd New
24	Rorze	RT107-1201-002	X-Axis Control Unit included,CURT-126-0	OEM Used
25		0190-77116	Flexible Disk	OEM Used
26	Kaydon	SME0110A	Kaydon Bearings	OEM New
27	Yaskawa	SGMS-50A6AB	SGMS-50A6AB Servo Motor	OEM New
28		SP140p-MX1-10	Wittenstein Planetary Gearhead 121-OAM 10 to 1 Ratio	OEM New
29		PV1-44	Needle valves	2nd New
30		0190-35076	POWER SUPPLY DRAWER 5200	2nd New
31		275185	MKS Convectron Gauge	OEM New
32		0100-77001	MIRRA® Backplane Board (Obsolete)	2nd New
33	THK	HSR20HA2SSM	THK Linear Guide	2rd New
34		0100-35034	STEPPER DRIVER PWER DISTRIBUTION BD	2nd New
35		0100-35063	Contact Relay Driver Board	2nd New
36		0100-75548	CHAMBER DI/O BACKPLANE	2nd New
37	KLA	710-404368-00	KLA ALIB1 Board	OEM Used
38	KLA	712-404056-00	KLA Motor CPU 4MB With 1MP EP Ran	OEM Used
39	KLA	MATROX IM-CLD	MATROX IM-CLD/AT BOARD 377-01	OEM Used
40	KLA	710-679821-00	KLA ZPLL2	OEM Used
41	KLA	710-404338-00	KLA PCB Board	OEM Used
42	KLA	710-404228-00	KLA Limit Breakout Board	OEM Used
43	KLA	710-650201-20	KLA BASEPLATE FLEX	OEM Used
44	KLA	710-653699-20	KLA MIB BOARD	OEM Used
45	KLA	710-651090-20	KLA OPTICS INT	OEM Used
46	KLA	710-451730-00	KLA ENCODER INTERFACE	OEM Used
47	KLA	710-658340-20	KLA ROBOT Z BOARD	OEM Used
48	KLA	710-404144-00	KLA PZTFED	OEM Used
49	KLA	710-659603-20	KLA Y-SAC Single Axis Controller	OEM Used
50	KLA	712-404561-00	KLA MM6326 8M Main Memory	OEM Used
51	KLA	710-652010-20	KLA Single Axis Controller Board	OEM Used
52	KLA	710-500101-20	KLA MIB ASSY	OEM Used
53	KLA	710-650074-20	KLA ZPLL BOARD	OEM Used
54	KLA	710-658770-20	KLA Single X-Axis Controller	OEM Used
55	KLA	710-659846-00	KLA XFLEX3 BOARD	OEM Used
56	KLA	710-404146-00	KLA Extension board	OEM Used
57	KLA	710-650094-20	KLA VAC BOARD	OEM Used
58	KLA	710-657600-20	KLA AUTO FOCUS BOARD	OEM Used
59	KLA	710-650204-20	KLA Y-Flex	OEM Used
60	KLA	710-650879-20	KLA DUAL STEPPER DRIVER	OEM Used
61	KLA	710-657231-20	KLA NSC2	OEM Used
62	KLA	710-658161-20	TDI SENSOR BOARD ASSY	OEM Used
63	KLA	710-404556-00	KLA DRIVER BOARD	OEM Used

02.

No	Maker	P/N	Description	Condition
1		0100-76124	AMAT MIRRA MESA® System Controller	2nd New
2			CMP MIRRA MESA®	2nd New
3			New PC type with New Window OS TL FABs®	2nd New
4			CMP MIRRA® POLISHER	2nd New
5			Ebara® EPO-222A	2nd New
6			CMP MESA® CLEANER	2nd New
7			Centura® Ultima Standard	OEM As is
8			Centura® DxZ	2nd New
10			Endura® 5500 Mainframe	2nd New
11			Centura® PVD	Used, Deinstalled
12			Endura® 5500 Main AC Rack	OEM Refurbished
13			Endura® 5500 Generator Rack	2nd New
14			Endura® 5500 System Controller	2nd New
15			Endura® 5500 PVD System	2nd Refurbished
16			Centura® DPS+ Metal	OEM Refurbished
17			Centura® DPS+ Poly	2nd New
18			Centura® Super E	2nd New
19			Centura® eMax	Refurbished
20	Nikon		Nikon NSR-S204B KrF Scanner	OEM As-is
21	CANON		CANON FPA-3000i4	OEM As-is
22	Nikon		Nikon NSR-2205 i12D	OEM As-is
23	Nikon		Nikon NSR-2205 EX14C	OEM As-is
24	Nikon		Nikon NSR-2205 EX14C	OEM As-is
25	TEL		TEL Mark 7	OEM As-is
26	ASML		ArF Immersion XT-1700Fi	OEM As-is
27	ASML		AT850	OEM As-is

03.

Tool #	ETSG No	RV Tool ID	Process	OEM	Model	Configuration (chambers)
1	E10-0001	LMA5H1	II/SPT	AG	HP8800#244
2	E10-0119	LMA5H2	II/SPT	Mattson (Steag on nameplate)	HP8800
3	E10-0002	LMA5H3	II/SPT	AG	HP8800#419
4	E10-0164	LMA5H4	II/SPT	Steag RTP System	HP8800#525
6	E10-0013	ASH1C8	Dry Etch	Alcantec/Canon	MAS-8200	2 chambers, 1 generator -LD: 2ea, No modification
7	E10-0009	ASH1C3	Dry Etch	Alcantec/Canon	MAS-8000	1 chamber lite etch CF4 LD: 1ea, Asyst, different type
8	E10-0008	ASH1C2	Dry Etch	Alcantec/Canon	MAS-8200	2 chambers, 1 generator -LD: 1ea, modified to Asyst
9	E10-0014	ASH1C9	Dry Etch	Alcantec/Canon	MAS-8200	2 chambers, 1 generator - LD: 2ea, No modification
10	E10-0007	ASH1C1	Dry Etch	Alcantec/Canon	MAS-8220	2 chambers, 2 generators Chamber: 2ea Ashing, 2ea Cooling LD: 1+1ea(2 type), Asyst -> ver1.1.1.1
11	E10-0010	ASH1C5	Dry Etch	Alcantec/Canon	MAS-8220	2 chambers, 2 generators Chamber: 2ea Ashing, 2ea Cooling LD: 1+1ea(2 type), Asyst -> ver1.1.1.1
12	E10-0011	ASH1C6	Dry Etch	Alcantec/Canon	MAS-8220	2 chambers, 2 generators LD: 2ea, modified to Asyst -> ver1.2.0.0
13	E10-0012	ASH1C7	Dry Etch	Alcantec/Canon	MAS-8220	2 chambers, 2 generators LD: 2ea, Asyst -> ver1.1.1.1
14	E10-0015	ASH1CA	Dry Etch	Alcantec/Canon	MAS-8220	2 chambers, 2 generators LD: 2ea(?), no midification Pump: 2ea -> ver1.2.0.0
15	E10-0019	DRO1EZ	Dry Etch	AMAT	Centura MXP Etch	1 EMAX, 2 Super E, 1 MXP, 1 Orienter
18	E10-0026	LMA5C1	II/SPT	AMAT	Centura RTP	2 Chambers RTP XE +, 2 Cool Down
19	E10-0027	LMA5C2	II/SPT	AMAT	Centura RTP	2 Chambers RTP Xe, 2 Cool Down
20	E10-0028	LMA5C3	II/SPT	AMAT	Centura RTP	2 Chambers RTP Xe, 2 Cool Down
22	E10-0029	LPW2W1	DCVD	AMAT	Centura MCVD	2 Chamber WxZ, 1 Orienter/degas, Preclean 23.11.08 Not sure if there is Pre Clean, robot is HP+
23	E10-0020	DRP1P2	Dry Etch	AMAT	CenturaII DPS	3 chamber DPS Poly, 1 Orienter/degas
24	E10-0021	DRP1P3	Dry Etch	AMAT	CenturaII DPS	3 chamber DPS Poly, 1 Orienter /degas
25	E10-0022	DRP1P5	Dry Etch	AMAT	CenturaII DPS	2 chamber DPS Poly, 1 Orienter/degas
26	E10-0023	DRP1P6	Dry Etch	AMAT	CenturaII DPS	3 chamber DPS Poly, 1 Orienter/degas 23.11.08 2 chambers converted to 8 inch mm Ceramic E
27	E10-0024	DRP1PZ	Dry Etch	AMAT	CenturaII DPS	300mm DPS Metal chamber with 200mm ESC Mainframe: 300mm
30	E10-0018	DRN1E1	Dry Etch	AMAT	Centura e-MAX	2 Chamber Emax, 1 Orienter/degas
44	E10-0016	CMW3P3	Wet/CMP	AMAT	CMP 5201 (Mirra-3400)	4 Titian 1 heads, 2 plantens
45	E10-0017	CMW3P5	Wet/CMP	AMAT	CMP 5201 (Mirra-3400)	4 Titian 1 heads, 2 plantens
49	E10-0154	WSA3AZ	Wet/CMP	Semitool Raider	R208FMC2[2MEG2SA]08[RCA]S	4 bowls, 2ea LD Chem cabinet, Ozone Gen., Pump, Chiller
50	E10-0025	ISP7A2	Metrology	AMAT	SEMVision G2	Inspection LD: 2ea, Asyst
51	E10-0030	LSN2G1	DCVD	AMAT	SiNgen Centura	3 chambers SiNgen, 2 orienter/ EMP cool down
54	E10-0034	SPT5A1	II/SPT	ANELVA	ILC-1060 SVII Plus-1	See attachment PVD Config Chamber: 6ea, 4+1ea PM(1ea is Etch), 1ea heat LD: 2ea, Fortrend
55	E10-0035	SPT5A2	II/SPT	ANELVA	ILC-1060 SVII Plus-1	See attachment PVD Config Chamber: 6ea, 4+1ea PM(1ea is Etch), 1ea heat LD: 2ea, Fortrend
56	E10-0037	SPT5A4	II/SPT	ANELVA	ILC-1060	See attachment PVD Config
57	E10-0036	SPT5A3	II/SPT	ANELVA	ILC-1080 PVD (Cosmos 200)	See attachment PVD Config Chamber: 4ea, 2+1ea PM, 1ea buffer LD: 3ea
58	E10-0038	SPT5A5	II/SPT	ANELVA	ILC-1080 PVD (Cosmos 200)	See attachment PVD Config Chamber: 5ea, 3+1ea PM, 1ea buffer LD: 3ea Pump: 2ea, cryo pump compressor, Anelva P-876CA-B
59	E10-0031	DRN1I1	Dry Etch	ANELVA	ILD-4100	2 etch chamber LD: 2ea, Asyst Pump: Ebara, A10S
60	E10-0032	DRN1I2	Dry Etch	ANELVA	ILD-4100	2 etch chamber LD: 2ea, Asyst
61	E10-0033	No Production code	Dry Etch	ANELVA	ILD-4100SR	2 Chamber Nitride Etch
62	E10-0040	SVTC Stored	DCVD	ASML	AVP BTBAS	LPCVD Verticle Furnace
63	E10-0039	PCO2E1	DCVD	ASM	EAGLE-10	2 Chamber: PE CVD
64	E10-0041	BSM5X2	II/SPT	AST	PEVA-900E E-Gun evaporator	4 crucible turret, planetary wafer system Advanced System Technology(CN, 聚昌科技)
65	E10-0042	BSM5X3	II/SPT	AST	PEVA-900E E-Gun evaporator	4 crucible turret, planetary wafer system Advanced System Technology(CN, 聚昌科技) -> with CTI compressor, Telemark Power supply, clean table
66	E10-0043	ALD2AZ	DCVD	Aviza	Celsior (ALD-Celsior FXP)	2 Chamber ALD: 1 Ox, 1 Metal Chamber: PM1 ADL Hi K, PM2 ALD Metal TM: Robot Brooks, MagnaTran7 LD: 2ea, Brooks Pump: 2ea, Edwards, IH1000 Acc: MKS Ozone,
68	E10-0165	RVP2RZ	DCVD	SVG	RVP-9000	LPCVD Verticle Furnace
70	E10-0044	APM2J1	DCVD	Aviza	WJ-999R CVD	Atmospheric Depo LD: 3ea, no modification
73	E10-0045	IIH5S2	II/SPT	Axcelis	NV-GSD III	See attachment for Ion Implant Mainframe: Chamber: LD: 1ea, outer, Asyst, 4ea original Pump:
74	E10-0073	IIM5M1	II/SPT	Eaton	NV-GSD/HE	See attachment for Ion Implant 23.11.08 Original 6 inch, converted to 8 inch
75	E10-0074	IIM5M2	II/SPT	Eaton	NV-GSD-HE	See attachment for Ion Implant
76	E10-0046	MRF7B1	Metrology	Beckman	DU650i
77	E10-0085	WST7I1	Metrology	Irvine Optical Co.	SCS-3000	Brooks SC3000 wafer sorter Irvine Optical Co. is Brooks Automation Sorter Biz unit
78	E10-0047	WST7I2	Metrology	Brooks	WaferSorter	Brooks SCS3000 wafer sorter
79	E10-0048	WST7I3	Metrology	Brooks	WaferSorter	Brooks SC3000 wafer sorter
80	E10-0086	WST7I4	Metrology	Irvine Optical Co.	SCS-3000	Brooks SC3000 wafer sorter
81	E10-0049	BSM5X1	II/SPT	CHA	SEC-1000-RAP	-> with Power supply, CTI compressor, Ebara pump 23.11.08 John D. Special Evaporator.
82	E10-0050	LMK7Q3	Dry Etch	Coherent	Waferlase ID200
85	E10-0051	OVN104	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
86	E10-0052	OVN106	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
87	E10-0053	OVN107	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
88	E10-0054	OVN108	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
89	E10-0055	OVN109	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
90	E10-0056	OVN110	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
91	E10-0057	OVN111	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
92	E10-0058	OVN112	Sort	Despatch	LCC1-87N-2	Sort wafer bake oven
94	E10-0059	BGX3X2	Wet/CMP	Disco	DFG840	2 grind tables
95	E10-0060	BGX3X3	Wet/CMP	Disco	DFG841	2 grind tables
96	E10-0061	CSC0P1	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
97	E10-0062	CSC0P2	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
98	E10-0063	CSC0P4	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
99	E10-0064	CSC0P6	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
100	E10-0065	CSC0P7	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
101	E10-0066	CSW0P3	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
102	E10-0067	CSW0P5	Wet/CMP	DNS	AS-2000	Dual brush and top side brush chambers, spin dry
103	E10-0071	WPO3D1	Wet/CMP	DNS	SR-2000-A (Aquaspin)	4 cup Solvent PR stripper -> 2LD modified (Fortrend)
104	E10-0072	WPO3D2	Wet/CMP	DNS	SR-2000-A (Aquaspin)	4 cup Solvent PR stripper
105	E10-0068	SCR2D1	Wet/CMP	DNS	SS-W80A-AR
106	E10-0069	SCR2D2	Wet/CMP	DNS	SS-W80A-AR
107	E10-0070	SCR2D3	Wet/CMP	DNS	SS-W80A-AR
108	E10-0075	BCC3L2	Wet/CMP	Enya	Box Washer	Conveyer system to clean Sort lot boxes, casettes, etc
109	E10-0076	PBR708	Sort	FTS / TEL	FTI-1000 (Test) P-8XL (Prove)	High voltage tester + prober
110	E10-0077	DRA1H1	Dry Etch	Hitachi	M-602A	2 Etch, 2 strip LD: 2ea, Fortrend Punp: 6ea, 4+2, Ebara, AA40W, AA10
111	E10-0078	DRA1H2	Dry Etch	Hitachi	M-602A	2 Etch, 2 strip LD: 2ea, Fortrend
112	E10-0079	MCD7H1	Metrology	Hitachi	S-9220	CD Sem 23.11.08 Converted to 6 inch, Clear Wafer
113	E10-0081	MCD7H4	Metrology	Hitachi	S-9220	CD Sem
114	E10-0082	MCD7H5	Metrology	Hitachi	S-9220	CD Sem
115	E10-0080	MCD7H3	Metrology	Hitachi	S-9200	CD Sem
116	E10-0087	MWT7V1	Metrology	Iwatsu	ST-0505	Thickness meter
117	E10-0088	ISP7J1 ( 7E1 part of)	Metrology	JEOL	JWS-7555	Inspection with EDAX LD: 1ea, Fortrend
118	E10-0089	WAO3E1	Wet/CMP	Kaijo	RT-1033T	3 BHF (20C), HF/H2O2 at 20C) 4 DIW tanks, 1 Marangoni Dryer Pre-dopos etcher LD/ULD modify (Shinko)
119	E10-0093	WSA3A1	Wet/CMP	Kaijo	RT-1035T/SR-206	2 SC1 tanks(65C), 1 piranha (110C), 2 DIW tanks, Spin Dry -> 4LD modify (Shinko)
120	E10-0094	WSA3A2	Wet/CMP	Kaijo	SRT-206	Carrierless, SC1 (65C), 2 piranha (110C/140C), Spin Dry -> 4LD modify (Shinko)
121	E10-0091	WPA3R1	Wet/CMP	Kaijo	RT-1041T	2 piranha (140C), 2 SC1 (65C) 3 Hot DIW rinse (65C) Spin Dry -> 4LD modify (Shinko)
122	E10-0092	WPA3R2	Wet/CMP	Kaijo	RT-1041T
123	E10-0163	WHM3H1	Wet/CMP	Steag Microtech	Marangoni Dryer	1 SC2 tank 45C, 1 High Concentration SC1, tank 25C, 2 DIW tanks, Maragoni dryer
124	E10-0090	WBR3J1	Wet/CMP	Kaijo	RT-575	2 SC1 tanks (35C and 65C) 2 DIW tanks, Spin Dryer -> 2LD modify (Shinko)
125	E10-0100	MAI7K3	Metrology	KLA/Ten	AIT III	LD: Asyst modified
126	E10-0096	IRC7C1	Metrology	KLA/Ten	Archer-10
127	E10-0103	MST7YZ	Metrology	KLA/Ten	Flexus2320	Thin film stress measure
129	E10-0104	MTE7U1	Metrology	KLA/Ten	FT750
130	E10-0101	MRH7Y2	Metrology	KLA/Ten	HRP-240
131	E10-0099	MAI7K2	Metrology	KLA/Ten	KLA-2367-IS	Automatic defect inspection
132	E10-0107	RPC4R1	Metrology	KLA/Ten	KLA-301 (IC)
133	E10-0097	IRC7C2	Metrology	KLA/Ten	KLA-51XX	LD: 2ea, Asyst 23.11.08 Installed as 6 inch, converted to 8 inch
134	E10-0098	IRC7C3	Metrology	KLA/Ten	KLA5200	LD: 2ea, Asyst 23.11.08 Installed as 6 inch, converted to 8 inch
136	E10-0102	MRH7Y3	Metrology	KLA/Ten	P 2H
137	E10-0095	MCG7Z1	Metrology	Keithley	64000	Charge monitor, Oxide quality
144	E10-0106	MTE7U8	Metrology	KLA/Ten	Auto SM300	Model#: 289108 (same as 7K4)
147	E10-0105	MTE7U3	Metrology	KLA/Ten	UV-1050 (Prometrix)
150	E10-0111	UMCJ Crated	DCVD	Kokusai	DJ-825V	Single tube furnace
151	E10-0110	LPH2K1	DCVD	Kokusai	DJ-853V	LPCVD Verticle Furnace
152	E10-0108	DI96K1	DCVD	Kokusai	DD-853V	Single tube furnace High temp. Oxide
153	E10-0109	DI96K2	DCVD	Kokusai	DD-853V	Single tube furnace High temp. Oxide
155	E10-0114	OVI101	PR	Koyo Lindberg	CLH-21CD	Baking gold, Not enough infor. In pictures 23.11.08 6 inch config.
156	E10-0112	No Production code	PR	Koyo Lindber	Koyo Oven	Wafer Inspection Probably oven like other 2 tools
157	E10-0115	DRA1LZ	Dry Etch	LAM	9600	Etch, Strip, water chambers
158	E10-0161	WBE3Z4	Wet/CMP	SEZ	SEZ 203	HF and 70BE
159	E10-0162	WBE3ZZ	Wet/CMP	SEZ	SP203-8-B/F	Backside clean, Al etch TDCS(?) use only
160	E10-0116	RSN7L1	Metrology	Leica	INS2000
161	E10-0117	LMK7Q2	Metrology	Lumonics	WMDCS	Marker
162	E10-0118	ASH1M1	Dry Etch	Mattson	Aspen	Dual Chamber Strip Seems LD is small than 8inch wafer Pump: 2ea, Kashiyama, SDE603X Acc: 4ea RF Gen.,
163	E10-0121	WEX7S9	Metrology	MGI Automation	EET10395F-2-U	Wafer exchanger
164	E10-0120	WEX7S1	Metrology	MGI Automation	EET10395F-2-U	Wafer exchanger
165	E10-0122	DES6Z1	Metrology	Multi	Dessicator	Plastic Box with N2 Purge
166	E10-0123	DES6Z2	Metrology	Multi	Dessicator	Plastic Box with N2 Purge
167	E10-0124	DES6Z3	Metrology	Multi	Dessicator	Plastic Box with N2 Purge
168	E10-0113	LMK7Q1	Dry Etch	Koyo Lindberg	SL473E	YAG Rod Laser Marker
173	E10-0128	STE4K1	PR	Nikon	NSR-EX14C	Step and Repeat System Cymer: ELS5400, SN: 98SA467001, Vintage: 1998.01.20
174	E10-0129	STE4K2	PR	Nikon	NSR-EX14C	Step and Repeat System Cymer: ELS5400, SN: Unknown, Vintage: Unknown
175	E10-0131	STP802 (401D-49)	PR	Nikon	NSR-i11C	Step and Repeat System 23.11.08 Converted from 6 to 8 inch
181	E10-0130	STP801 (4G1)	PR	Nikon	NSR-i9C	Step and Repeat System
182	E10-0125	SCK4S1	PR	Nikon	NSR-S204B	Laser Scanner Cymer: ELS-6400, SN:01SA489408, Vintage:2001.08.09
183	E10-0127	SCK4S3	PR	Nikon	NSR-S205C	Laser Scanner
184	E10-0126	SCK4S2	PR	Nikon	NSR-S206D	Laser Scanner Gigaphoton:
191	E10-0134	IIM5N2	II/SPT	Nissin	Exceed 2000A	See attachment for Ion Implant
192	E10-0135	IIM5N3	II/SPT	Nissin	Exceed 2000A	See attachment for Ion Implant
193	E10-0133	IIM5N1	II/SPT	Nissin	Exceed 2000AH	See attachment for Ion Implant
194	E10-0138	SRT3T2	Wet/CMP	Nitto Denko	DR8500-II	Wafer Taping pre-backgrind
196	E10-0137	SRT3T1	Wet/CMP	NITTO	NEL-DR8500II	Wafer Taping pre-backgrind
197	E10-0136	SRB3B1	Wet/CMP	NITTO	NEL-HR8500II	Wafer tape removing post-backgrind
198	E10-0146	PHO2HZ	DCVD	Novellus	Concept Two Speed	1 Chamber running, 1 chamber ready for install, 1 chamber parts Chamber: 1+1ea (1is installed, 1 not exist, but power units exist) LD: 2ea, no modification Pump: 1+2ea, Edwards, 23.11.08 1 PM ready, 1 PM ready to install
199	E10-0144	PCO2NY	DCVD	Novellus	Concept One	1 chamber, system type: Nit/Oxide Ver. 4.431 Pump: 1ea, Ebara, A10S Acc: 1+1ea RF Gen.(High, Low, both off)
200	E10-0145	PCO2NZ	DCVD	Novellus	Concept One	1 chamber type: Nitride/TEOS Ver. 4.431 ECO 4.43 Pump: 1ea, Ebara, A10S
201	E10-0141	PCO2N1	DCVD	Novellus	C2	Dual Sequel TEOS, Non Shrink
202	E10-0142	PCO2N2	DCVD	Novellus	C2	Dual Sequel TEOS, Non Shrink
203	E10-0143	PCO2N3	DCVD	Novellus	C2	Dual Sequel TEOS, Non Shrink
204	E10-0140	LPW2NB	DCVD	Novellus	C2 Altus	Dual Altus, Non Shrink 23.11.08 1 chamber standard, 1 chamber PNL Mod s
205	E10-0139	LPW2NA (245-2)	DCVD	Novellus	C2 Altus	Dual Altus, Non Shrink
207	E10-0147	MPB7P2	Metrology	Phillips	SPW-2800
208	E10-0148	MPB7P3	Metrology	Phillips	PW-2830	XRF Wafer Scan
209	E10-0149	MTE7U4	Metrology	Rudolph	FE-VII-SD
210	E10-0150	MTE7U6	Metrology	Rudolph	FE-VII-D
211	E10-0151	MTM7R1	Metrology	Rudolph	MetaPulse MP300X Cu
216	E10-0153	WPO3SY	Wet/CMP	Semitool	WST308A(1CC)BT	1 bowl, 2 tanks
217	E10-0152	BCC3Q1	Wet/CMP	Semitool	Storm III	Multi ladder system to clean 200mm cassettes and SMIF Pod base and top
218	E10-0157	IIH5S4	II/SPT	SEN	GSD-III 180	See attachment for Ion Implant GSD180 LD: No modification
219	E10-0155	IIH5S1	II/SPT	SEN	NV-GSD-LED	See attachment for Ion Implant LD: 3ea, modified to Asyst
220	E10-0156	IIH5S3	II/SPT	SEN	NV-GSD-LED	See attachment for Ion Implant LD: 2ea, modified to Asyst
221	E10-0158	WBE3Z1	Wet/CMP	SEZ	SP203-8-B	49% HF at 55C, 49% HF at 25C, 70 BE at 30 C LD: 2ea, Fortend modified
222	E10-0159	WBE3Z2	Wet/CMP	SEZ	FRM203-8-B/F	3 mediums: HFx1, 70BEx2 LD: 2ea, Fortend modified
223	E10-0160	WBE3Z3	Wet/CMP	SEZ	SEZ203	3 mediums: HFx1, 70BEx2 LD: 2ea, Fortend modified
226	E10-0223	RXC4T1	PR	Toray	No data on nameplate	Reticle Transfer Syset
227	E10-0167	MRX7F3	Metrology	Technos	TR620T[6220]
228	E10-0166	MRX7F2	Metrology	Technos	TR620T[6228]
229	E10-0168	No Production code	Dry Etch	Tegal	Etch 6500
230	E10-0169	No Production code	Dry Etch	Tegal	Etch 6500U	Single Chamber -> Probably 2PM (HRe 2.1&4.0)
231	E10-0170	DI16F1	DCVD	TEL	a-8	LPCVD Verticle Furnace- Need Temperture Range
232	E10-0171	DI16F2	DCVD	TEL	a-8	LPCVD Verticle Furnace- Need Temperture Range
233	E10-0199	LPC2T4	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
234	E10-0200	LPC2T9	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
235	E10-0201	LPC2TC	DCVD	TEL	a-8S-Z	LPCVD Verticle Furnace- Need Temperture Range
236	E10-0205	LPN2T0	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
237	E10-0206	LPN2TG	DCVD	TEL	a-8S-Z	LPCVD Verticle Furnace- Need Temperture Range
238	E10-0207	LPP2T2	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
239	E10-0208	LPP2TE	DCVD	TEL	a-858SC	LPCVD Verticle Furnace- Need Temperture Range
240	E10-0209	LPT2T3	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
241	E10-0210	LPT2TA	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
242	E10-0173	DI46H2	DCVD	TEL	a-8S-D	LPCVD Verticle Furnace- Need Temperture Range
243	E10-0174	DI46H3	DCVD	TEL	a-8S-D	LPCVD Verticle Furnace- Need Temperture Range
244	E10-0179	DIA6P1	DCVD	TEL	a-8S-D	LPCVD Verticle Furnace- Need Temperture Range
245	E10-0180	DIA6P2	DCVD	TEL	a-8S-D	LPCVD Verticle Furnace- Need Temperture Range
246	E10-0203	LPH2T5	DCVD	TEL	a-8S-C	LPCVD Verticle Furnace- Need Temperture Range
247	E10-0204	LPH2TB	DCVD	TEL	a-8S-Z	LPCVD Verticle Furnace- Need Temperture Range
248	E10-0172	DI46H1	DCVD	TEL	a-8S-Z	Diffusion Furnace, torch w/ heater
249	E10-0212	OVI6L1	DCVD	TEL	a-8S-D	LPCVD Verticle Furnace- Need Temperture Range
251	E10-0213	PCD0S1	PR	TEL	ACT8	3 Develop, 2 coat cups, WEE, 3 Chill plates, 3 Chill/hot plates, 6 Precision chill/hot plates, 2 adhesion units, 2 cup washer Right, 2C, 2+?D, 2AD, 1PHP, 4HHP, 2LHP, 3CHP, 5PCH, 4CPL, 2CWH, 2TRS Mainframe : Dual Block LD: no modification
252	E10-0214	PCD0S2	PR	Nikon	Nikon NSR-i12 i-Line Wafer Stepper	Step and Repeat
253	E10-0215	PCD0S3	PR	TEL	ACT8	2 coat, 3 develop, WEE, 8 Chill hot plates, 4 low temp hot plates, 4 chill plates, 2 adhesion units, 1 cup wash Left, 4C, 4D, 2AD, 8PHP, 2HHP, 8LHP, 8HCP, 2HSH, 1CWH, 3TRS Mainframe : Dual Block LD: 2ea modified to Asyst
256	E10-0175	DI46H4	DCVD	TEL	Alpha 808SD	LPCVD Verticle Furnace- Need Temperture Range
257	E10-0176	DI46H5	DCVD	TEL	Alpha 808SD	LPCVD Verticle Furnace- Need Temperture Range
258	E10-0202	LPC2TF	DCVD	TEL	Alpha 808SC	LPCVD Verticle Furnace- Need Temperture Range
259	E10-0177	DI46H6	DCVD	TEL	Alpha 808SD	LPCVD Verticle Furnace- Need Temperture Range
260	E10-0178	DI66C1	DCVD	TEL	a-8S-ZA	LPCVD Verticle Furnace- Need Temperture Range
277	E10-0195	GMP102	Sort	Tel	P-8	Prober
278	E10-0196	GMP201	Sort	Tel	P-8	Prober
279	E10-0197	GMP202	Sort	TEL	P-8XL	Prober
280	E10-0198	GMP204	Sort	Tel	P-8	Prober
281	E10-0193	DRP1T2	Dry Etch	TEL	TE-8401	Single Chamber
282	E10-0194	DRP1T3	Dry Etch	TEL	TE8401	Single Chamber LD: 2ea, no modification Pump: 2ea
283	E10-0211	No Production code	Dry Etch	TEL	TE8401	1 chamber Poly Etch
284	E10-0191	DRO1T1	Dry Etch	TEL	TE8500PESC	1 chamber LD: 2ea, Fortrend Pump: 2ea, Ebara, A30W
285	E10-0192	DRO1T4	Dry Etch	TEL	TE8500P	1 chamber LD: 2ea, no modification Pump: 2ea, Kashiyama
286	E10-0190	DRO190	Dry Etch	TEL	Unity DRM (U2e-855DD)	2 chamber Unity2 DRM
287	E10-0186	DRO186	Dry Etch	TEL	Unity DRM (U2e-855DD)	2 chamber Unity2 DRM
288	E10-0188	DRO188	Dry Etch	TEL	Unity DRM (U2e-855DD)	2 chamber Unity2 DRM
289	E10-0187	DRO187	Dry Etch	TEL	UNITY85DI (U2S-855II)	2 Chamber, IEM
290	E10-0185	DRO185	Dry Etch	TEL	UNITY85DI (U2S-655II)	2 Chamber, IEM: Chambers Final
291	E10-0182	DRO182	Dry Etch	TEL	UNITY85DI (U2S-855II)	2 Chamber, IEM, Chambers: Standard & Final
292	E10-0183	DRO183	Dry Etch	TEL	UNITY85DI (U2S-855II)	2 Chamber, IEM, Chambers: COC & Final
293	E10-0184	DRO184	Dry Etch	TEL	UNITY85DI (U2S-855II)	2 Chamber, IEM: Chambers Final
294	E10-0181	DRO181	Dry Etch	TEL	UNITY85DS (U2S-855II)	2 chamber SCCM
295	E10-0189	DRO189	Dry Etch	TEL	UNITY85DS (U2E-855SS)	2 chamber SCCM
296	E10-0216	WPA3E2	Wet/CMP	TEL	UW-200Z	piranha (130C), SC1 (65C) BHF (20C) 3 DIW, IPA Vap dry
297	E10-0217	WSA3A3	Wet/CMP	TEL	UW-200Z	1 piranha 140C, 1 SC1 65C, BHF 20C, 3 DIW Tank, IPA Vap dry
298	E10-0084	MVT6V4	Sort	HP/TEL	4062UX (Test) P8 (Probe)	Tester:4062UX, prober: P8
299	E10-0005	MVT6V5	Sort	Agilent/TEL	E3102A (Test) P8 (Probe)	Agilent 4072A, TEL P8 Prober
300	E10-0083	MVT6V1	Sort	HP/TEL	E3101A (Test) P8XL (Probe)	Tester: E3101A/4071A, prober: P8XL
301	E10-0004	MVT6V3	Sort	Agilent/TEL	E3102A (Test) P8XL (Probe)	Agilent 4072A, TEL P8XL Prober -> couldn't find chiller, no nameplate picture
302	E10-0006	MVT6V6	Sort	Agilent/TEL	E3103A (Tester) P8XL (Probe)	Tester: E3103A/4073A, prober: P8XL With Chiller
303	E10-0003	MVT6V2	Sort	Agilent/TEL	E3103B (Test) P8XL (Probe)	Agilent 4073B,TEL P8XL Prober -> couldn't find chiller, no nameplate picture for probe (Temp. set 14C)
305	E10-0219	MTE7T1	Metrology	Thermawave	OPTI PROBE 2600
306	E10-0220	MTE7T2 (332B-1)	Metrology	Thermawave	OP3290
307	E10-0218	MDS7O1	Metrology	Thermawave	TP-500	Single wafer metrology for Implant
308	E10-0221	RST4Z1	Metrology	TIMEC	GRS-7100
309	E10-0222	RST4Z2	Metrology	TIMEC	GRS-7100
310	E10-0132	INS404	Sort	Nikon -> Toray	Optiphot-200 NWL-851 -> Inspectra 1000EX-IIL	Final visual inspection
311	E10-0224	MSR7V2	Metrology	TSK	Surfcom 590A
312	E10-0225	WMO3M1	Wet/CMP	TYK	Etcher	Manual wet bench 3 BHF tanks (Teflon) 1 Mix tank - heated, Semitool S/D -> QDR*5, Sitek(Semitool auto rinse 1)
313	E10-0226	WNI3N1	Wet/CMP	TYK	ANWE-081	3 H3PO4 tanks at 160C, 3 Hot DIW tanks at 65C, Spin Dry -> 2LD modify (Shinko)
314	E10-0227	UVC4U1	PR	Ushio	UMA-1002-HC93NS	Single wafer processing with UV Bulb
315	E10-0228	UVC4U2	PR	Ushio	UMA-1002	Single wafer processing with UV Bulb ->Never used, not put in to system
317	E10-0229	DRI1VZ	Dry Etch	Veeco	RF-350S Ion Mil	Ion Mil
		PHO2H1		AMAT	Centura-HDP	Applied Materials Centura HDP CVD
		PHO2H2		AMAT	Centura-HDP	Applied Materials Centura HDP CVD
		PHO2H5		AMAT	Ultima HDP	Applied Materials Ultima HDP CVD
		DRA1A1		AMAT	DPS	Applied Materials DPS Centura Al Dry Etcher
		DRA1A2		AMAT	DPS	Applied Materials DPS Centura Al Dry Etcher
		PCD0H3		TEL	Mark-VIII	Tokyo Electron Mark-VIII Photoresist Coater & Developer
		PCR4C1		TEL	Mark-VIII	Tokyo Electron Mark VIII Coater
		PCR4C2		TEL	Mark-VIII	Tokyo Electron Mark VIII Coater
		PCR4C3		TEL	Mark-VIII	Tokyo Electron Mark VIII Coater
		PDR0I1		TEL	Mark-VIII	Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB
		PDR0I2		TEL	Mark-VIII	Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB
		PDR0I3		TEL	Mark-VIII	Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB
		PDR0I4		TEL	Mark-VIII	Tokyo Electron Mark-VIII Photoresist Coater & Developer w/PEB
		PDR0K1		TEL	ACT8	Tokyo Electron Act8 200mm Coater & Developer w/PEB
		STD4H3		Nikon	NSR-i12	Nikon NSR-i12 i-Line Wafer Stepper
		STD4I1		Nikon	NSR-i14E	Nikon NSR-i14E i-Line Wafer Stepper
		STD4I2		Nikon	NSR-i14E	Nikon NSR-i14E i-Line Wafer Stepper
		STD4I3		Nikon	NSR-i14E	Nikon NSR-i14E i-Line Wafer Stepper
		STD4I4		Nikon	NSR-i14E	Nikon NSR-i14E i-Line Wafer Stepper
		PCD0K2		TEL	ACT8	Tokyo Electron ACT8 In Line Coater/Developer
		DET4D1		TEL	MARK VIII	Tokyo Electron Mark VII Developer/Scanner w/PEB
		SOD0H5		TEL	Mark-VIII	Tokyo Electron Mark-VIII Photoresist Coater & Developer
		PIA4P1		TEL	MARK VIII	Tokyo Electron Mark VIII Polyimide Coater and Developer
		MRH7Y4		KLA/Ten	P-22	P-22 Profilometer
		INP4N2		NIDEK	OPT-5	NIDEK OPT-R Visual Checker
		INP4N3		NIDEK	OPT-5	NIDEK OPT-R Visual Checker
		INS4N1		NIDEK	OPT-5	NIDEK OPT-R Visual Checker
		INS4N4		NIDEK	OPT-5	NIDEK OPT-R Visual Checker
		MPB7P1		Philips	SPW-2800	Philips concentration monitors
		SSU3Y0		Megasystems	IIIC	EPD6025 Oxide Slurry distribution unit
		SSU3YB		Megasystems		EPD 6025 Oxide Slurry distribution unit
		SSU3YC		SD		MFIIIB, Global Distribution W-slurry